Issued Patents All Time
Showing 101–125 of 125 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7666576 | Exposure scan and step direction optimization | Fu-Jye Liang, Lin-Hung Shiu, Chun-Kuang Chen, Burn Jeng Lin | 2010-02-23 |
| 7667821 | Multi-focus scanning with a tilted mask or wafer | Burn Jeng Lin, Chun-Kuang Chen, Chia-Hui Lin, Ru-Gun Liu, Jen-Chieh Shih | 2010-02-23 |
| 7659964 | Level adjustment systems and adjustable pin chuck thereof | Burn Jeng Lin, Jeng-Horng Chen | 2010-02-09 |
| 7643976 | Method and system for identifying lens aberration sensitive patterns in an integrated circuit chip | Jaw-Jung Shin, King-Chang Shu, Jan-Wen You | 2010-01-05 |
| 7580129 | Method and system for improving accuracy of critical dimension metrology | Shinn-Sheng Yu, Jacky Huang, Chih-Ming Ke | 2009-08-25 |
| 7517639 | Seal ring arrangements for immersion lithography systems | Burn Jeng Lin, Chun-Kuang Chen, Ru-Gun Liu, Shinn-Sheng Yu, Jen-Chieh Shih | 2009-04-14 |
| 7501226 | Immersion lithography system with wafer sealing mechanisms | Burn Jeng Lin, Chun-Kung Chen, Ru-Gun Liu, Shing Shen Yu, Jen-Chieh Shih | 2009-03-10 |
| 7479466 | Method of heating semiconductor wafer to improve wafer flatness | Hsiao-Tzu Lu, Burn Jeng Lin, Chin-Hsiang Lin, Kuei-Shun Chen | 2009-01-20 |
| 7450296 | Method and system for patterning alignment marks on a transparent substrate | Ruei-Hung Jang, Ya-Wen Lee, Tzu-Yang Wu, Sheng-Liang Pan, Chin-Hsiang Lin | 2008-11-11 |
| 7399709 | Complementary replacement of material | Burn Jeng Lin, Hua-Tai Lin, Ru-Gun Liu, Bang-Chien Ho | 2008-07-15 |
| 7393616 | Line end spacing measurement | Jiann Yuan Huang, Anderson Chang, Chih-Ming Ke, Heng-Jen Lee, Chin-Hsiang Lin | 2008-07-01 |
| 7307001 | Wafer repair method using direct-writing | Chin-Hsiang Lin, Burn Jeng Lin | 2007-12-11 |
| 7279267 | Method for manipulating the topography of a film surface | Burn Jeng Lin | 2007-10-09 |
| 7266803 | Layout generation and optimization to improve photolithographic performance | Shou-Yen Chou, Jaw-Jung Shin, Burn Jeng Lin | 2007-09-04 |
| 7234128 | Method for improving the critical dimension uniformity of patterned features on wafers | Jaw-Jung Shin, Jan-Wen You, Burn Jeng Lin | 2007-06-19 |
| 7180572 | Immersion optical projection system | Jen-Chieh Shih, Burn Jeng Lin, Ru-Gun Liu, Chun-Kuang Chen, Chin-Hsiang Lin +1 more | 2007-02-20 |
| 7135259 | Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control | Li-Jui Chen, Chih-Ming Ke, Bang-Ching Ho, Jen-Chieh Shih | 2006-11-14 |
| 7091502 | Apparatus and method for immersion lithography | Chun-Kuang Chen, Ru-Gun Liu, Burn Jeng Lin | 2006-08-15 |
| 6973636 | Method of defining forbidden pitches for a lithography exposure tool | Jaw-Jung Shin, Chun-Kuang Chen, Burn Jeng Lin, Li-Chun Tien, Mi-Chang Chang +4 more | 2005-12-06 |
| 6877152 | Method of inter-field critical dimension control | Anthony Yen, Burn Jeng Lin | 2005-04-05 |
| 6768538 | Photolithography system to increase overlay accuracy | Anthony Yen | 2004-07-27 |
| 6744058 | Geometric compensation method for charged particle beam irradiation | Li-Jui Chen | 2004-06-01 |
| 6361909 | Illumination aperture filter design using superposition | Chin-Chiu Hsia | 2002-03-26 |
| 6291118 | Elimination of proximity effect in photoresist | Chang-Ming Dai | 2001-09-18 |
| 6040119 | Elimination of proximity effect in photoresist | Chang-Ming Dai | 2000-03-21 |