Issued Patents All Time
Showing 51–75 of 125 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9356021 | Self-alignment for two or more layers and methods of forming same | Shih-Ming Chang, Ru-Gun Liu, Ken-Hsien Hsieh, Ming-Feng Shieh, Chih-Ming Lai | 2016-05-31 |
| 9337083 | Multi-layer metal contacts | Ming-Feng Shieh, Wen-Hung Tseng, Chih-Ming Lai, Ken-Hsien Hsieh, Ru-Gun Liu | 2016-05-10 |
| 9305841 | Method of patterning a feature of a semiconductor device | Yen-Chun Huang, Ming-Feng Shieh, Ken-Hsien Hsieh, Chih-Ming Lai, Ru-Gun Liu | 2016-04-05 |
| RE45943 | Measurement of overlay offset in semiconductor processing | Te-Chih Huang, Chih-Ming Ke | 2016-03-22 |
| 9245763 | Mechanisms for forming patterns using multiple lithography processes | Shih-Ming Chang, Ming-Feng Shieh, Chih-Ming Lai, Ru-Gun Liu | 2016-01-26 |
| 9214356 | Mechanisms for forming patterns | Ru-Gun Liu, Chung-Te Lin, Ming-Feng Shieh, Shih-Ming Chang | 2015-12-15 |
| 9201022 | Extraction of systematic defects | Jia-Rui Hu, Te-Chih Huang, Chih-Ming Ke, Hua-Tai Lin | 2015-12-01 |
| 9177797 | Lithography using high selectivity spacers for pitch reduction | Yu-Sheng Chang, Chung-Ju Lee, Cheng-Hsiung Tsai, Yung-Hsu Wu, Hsiang-Huan Lee +5 more | 2015-11-03 |
| 9153478 | Spacer etching process for integrated circuit design | Ru-Gun Liu, Shih-Ming Chang, Ken-Hsien Hsieh, Ming-Feng Shieh, Chih-Ming Lai +6 more | 2015-10-06 |
| 9070630 | Mechanisms for forming patterns | Ru-Gun Liu, Chung-Te Lin, Ming-Feng Shieh, Shih-Ming Chang | 2015-06-30 |
| 9054159 | Method of patterning a feature of a semiconductor device | Yen-Chun Huang, Ming-Feng Shieh, Ken-Hsien Hsieh, Chih-Ming Lai, Ru-Gun Liu | 2015-06-09 |
| 9026957 | Method of defining an intensity selective exposure photomask | Chia-Chu Liu, Kuei-Shun Chen, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu +9 more | 2015-05-05 |
| 9003336 | Mask assignment optimization | Wen-Chun Huang, Ken-Hsien Hsieh, Ming-Hui Chih, Chih-Ming Lai, Ru-Gun Liu +4 more | 2015-04-07 |
| 8987008 | Integrated circuit layout and method with double patterning | Ming-Feng Shieh, Ru-Gun Liu, Hung-Chang Hsieh, Yao-Ching Ku | 2015-03-24 |
| 8984450 | Method and apparatus for extracting systematic defects | Jia-Rui Hu, Kai-Hsiung Chen, Chih-Mihg Ke, Hua-Tai Lin | 2015-03-17 |
| 8962464 | Self-alignment for using two or more layers and methods of forming same | Shih-Ming Chang, Ru-Gun Liu, Ken-Hsien Hsieh, Ming-Feng Shieh, Chih-Ming Lai | 2015-02-24 |
| 8959460 | Layout decomposition method | Wen-Chun Huang, Ming-Hui Chih, Chia-Ping Chiang, Ru-Gun Liu, Jia-Guei Jou +3 more | 2015-02-17 |
| 8943445 | Method of merging color sets of layout | Pi-Tsung Chen, Ming-Hui Chih, Ken-Hsien Hsieh, Wei-Long Wang, Wen-Chun Huang +4 more | 2015-01-27 |
| 8837810 | System and method for alignment in semiconductor device fabrication | Yen-Liang Chen, Te-Chih Huang, Chen-Ming Wang, Chih-Ming Ke | 2014-09-16 |
| 8835323 | Method for integrated circuit patterning | Ming-Feng Shieh, Ru-Gun Liu, Shih-Ming Chang | 2014-09-16 |
| 8765329 | Sub-resolution rod in the transition region | Jeng-Shiun Ho, Luke Lo, Ting-Chun Liu, Min Cheng, Jing-Wei Shih +6 more | 2014-07-01 |
| 8762899 | Method for metal correlated via split for double patterning | Burn Jeng Lin, Ru-Gun Liu, Wen-Chun Huang | 2014-06-24 |
| 8673520 | Intensity selective exposure photomask | George Liu, Kuei-Shun Chen, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu +9 more | 2014-03-18 |
| 8658344 | Patterning process and photoresist with a photodegradable base | Chien-Wei Wang, Ching-Yu Chang, Burn Jeng Lin | 2014-02-25 |
| 8656319 | Optical proximity correction convergence control | Cheng-Cheng Kuo, Ching-Che Tsai, Tzu-Chun Lo, Chih-Wei Hsu, Hua-Tai Lin +4 more | 2014-02-18 |