Issued Patents All Time
Showing 51–75 of 99 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9761414 | Uniformity control circuit for use within an impedance matching circuit | Felix Kozakevich, Kenneth Lucchesi, John Holland | 2017-09-12 |
| 9620334 | Control of etch rate using modeling, feedback and impedance match | Bradford J. Lyndaker, John C. Valcore, Jr., Seyed Jafar Jafarian-Tehrani, Zhigang Chen | 2017-04-11 |
| 9595424 | Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes | Felix Kozakevich, John Holland, Brett Jacobs | 2017-03-14 |
| 9536711 | Method and apparatus for DC voltage control on RF-powered electrode | Rajinder Dhindsa, Eric A. Hudson, Maryam Moravej, Andreas Fischer | 2017-01-03 |
| 9536749 | Ion energy control by RF pulse shape | Zhigang Chen, John Holland | 2017-01-03 |
| 9401264 | Control of impedance of RF delivery path | Rajinder Dhindsa, Ken Lucchesi, Luc Albarede | 2016-07-26 |
| 9396908 | Systems and methods for controlling a plasma edge region | Rajinder Dhindsa | 2016-07-19 |
| 9337004 | Grounded confinement ring having large surface area | Rajhinder Dhindsa | 2016-05-10 |
| 9337000 | Control of impedance of RF return path | Rajinder Dhindsa, Ken Lucchesi, Luc Albarede | 2016-05-10 |
| 9287096 | Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system | Eric A. Hudson, Rajinder Dhindsa, Neil Benjamin | 2016-03-15 |
| 9263240 | Dual zone temperature control of upper electrodes | Rajinder Dhindsa, Ryan Bise, Lumin Li, Sang Ki Nam, Jim Rogers +5 more | 2016-02-16 |
| 9251999 | Capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate | Rajinder Dhindsa, Eric A. Hudson, Andreas Fischer | 2016-02-02 |
| 9245720 | Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing system | Rajinder Dhindsa | 2016-01-26 |
| 9184074 | Apparatus and methods for edge ring implementation for substrate processing | Rajinder Dhindsa | 2015-11-10 |
| 9171702 | Consumable isolation ring for movable substrate support assembly of a plasma processing chamber | Michael C. Kellogg, Rajinder Dhindsa | 2015-10-27 |
| 9111731 | Gas feed insert in a plasma processing chamber and methods therefor | Anthony de la Llera, Michael C. Kellogg, Rajinder Dhindsa | 2015-08-18 |
| 8911590 | Integrated capacitive and inductive power sources for a plasma etching chamber | Rajinder Dhindsa, Mukund Srinivasan, Kenji Takeshita, Andreas Fischer | 2014-12-16 |
| 8911588 | Methods and apparatus for selectively modifying RF current paths in a plasma processing system | Sang Ki Nam, Rajinder Dhindsa | 2014-12-16 |
| 8911637 | Plasma-enhanced substrate processing method and apparatus | Rajinder Dhindsa, Hudson Eric, Andreas Fischer | 2014-12-16 |
| 8898889 | Chuck assembly for plasma processing | Sang Ki Nam, Rajinder Dhindsa | 2014-12-02 |
| 8894804 | Plasma unconfinement sensor and methods thereof | Jean-Paul Booth, Rajinder Dhindsa, Luc Albarede, Seyed Jafar Jafarian-Tehrani | 2014-11-25 |
| 8872525 | System, method and apparatus for detecting DC bias in a plasma processing chamber | Rajinder Dhindsa, Ken Lucchesi | 2014-10-28 |
| 8847495 | Movable grounding arrangements in a plasma processing chamber and methods therefor | Anthony de la Llera, Michael C. Kellogg, Rajinder Dhindsa | 2014-09-30 |
| 8826855 | C-shaped confinement ring for a plasma processing chamber | Michael C. Kellogg, Rajinder Dhindsa | 2014-09-09 |
| 8652298 | Triode reactor design with multiple radiofrequency powers | Rajinder Dhindsa, Gerardo Delgadino, Eric A. Hudson, Bi-Ming Yen, Andrew D. Bailey, III | 2014-02-18 |