Issued Patents All Time
Showing 26–50 of 99 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10825656 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Michael C. Kellogg, John Holland, Zhigang Chen, Felix Kozakevich, Kenneth Lucchesi | 2020-11-03 |
| 10755895 | Ion energy control by RF pulse shape | Zhigang Chen, John Holland | 2020-08-25 |
| 10622190 | Systems and methods for controlling a plasma edge region | Rajinder Dhindsa | 2020-04-14 |
| 10622195 | Multi zone gas injection upper electrode system | Ryan Bise, Rajinder Dhindsa, Lumin Li, Sang Ki Nam, Jim Rogers +6 more | 2020-04-14 |
| 10615003 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Michael C. Kellogg, John Holland, Zhigang Chen, Felix Kozakevich, Kenneth Lucchesi | 2020-04-07 |
| 10593516 | Multi-radiofrequency impedance control for plasma uniformity tuning | Rajinder Dhindsa | 2020-03-17 |
| 10553399 | Pulsed plasma chamber in dual chamber configuration | Rajinder Dhindsa, Eric A. Hudson, Andrew D. Bailey, III | 2020-02-04 |
| 10504744 | Three or more states for achieving high aspect ratio dielectric etch | Takumi Yanagawa, Nikhil Dole, Ranadeep Bhowmick, Eric A. Hudson, Felix Kozakevich +2 more | 2019-12-10 |
| 10381201 | Control of etch rate using modeling, feedback and impedance match | Bradford J. Lyndaker, John C. Valcore, Jr., Seyed Jafar Jafarian-Tehrani, Zhigang Chen | 2019-08-13 |
| 10340122 | Systems and methods for tailoring ion energy distribution function by odd harmonic mixing | Zhigang Chen, John Holland | 2019-07-02 |
| 10304662 | Multi regime plasma wafer processing to increase directionality of ions | Lin Zhao, Felix Kozakevich, Kenneth Lucchesi, Zhigang Chen, John Holland | 2019-05-28 |
| 10283330 | Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators | Felix Kozakevich, Michael C. Kellogg, John Holland, Zhigang Chen, Kenneth Lucchesi +1 more | 2019-05-07 |
| 10276348 | Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system | Eric A. Hudson, Rajinder Dhindsa, Neil Benjamin | 2019-04-30 |
| 10249476 | Control of impedance of RF return path | Rajinder Dhindsa, Ken Lucchesi, Luc Albarede | 2019-04-02 |
| 10181412 | Negative ion control for dielectric etch | Mirzafer Abatchev, Rajinder Dhindsa, Eric A. Hudson, Andrew D. Bailey, III | 2019-01-15 |
| 10157730 | Control of impedance of RF delivery path | Rajinder Dhindsa, Ken Lucchesi, Luc Albarede | 2018-12-18 |
| 10115564 | Uniformity control circuit for use within an impedance matching circuit | Felix Kozakevich, Kenneth Lucchesi, John Holland | 2018-10-30 |
| 10115568 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Michael C. Kellogg, John Holland, Zhigang Chen, Felix Kozakevich, Kenneth Lucchesi | 2018-10-30 |
| 10083853 | Electrostatic chuck design for cooling-gas light-up prevention | Alexander Matyushkin, John Holland, Keith Gaff, Felix Kozakevich | 2018-09-25 |
| 10026592 | Systems and methods for tailoring ion energy distribution function by odd harmonic mixing | Zhigang Chen, John Holland | 2018-07-17 |
| 10002746 | Multi regime plasma wafer processing to increase directionality of ions | Lin Zhao, Felix Kozakevich, Kenneth Lucchesi, Zhigang Chen, John Holland | 2018-06-19 |
| 9984859 | Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes | Felix Kozakevich, John Holland, Brett Jacobs | 2018-05-29 |
| 9852889 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Michael C. Kellogg, John Holland, Zhigang Chen, Felix Kozakevich, Kenneth Lucchesi | 2017-12-26 |
| 9793128 | Plasma processing chamber with dual axial gas injection and exhaust | Rajinder Dhindsa, Andrew D. Bailey, III | 2017-10-17 |
| 9793126 | Ion to neutral control for wafer processing with dual plasma source reactor | Rajinder Dhindsa, Sang Ki Nam, Eric A. Hudson | 2017-10-17 |