Issued Patents All Time
Showing 26–50 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10163610 | Extreme edge sheath and wafer profile tuning through edge-localized ion trajectory control and plasma operation | Saravanapriyan Sriraman, Tom A. Kamp | 2018-12-25 |
| 9640408 | Fast-gas switching for etching | Saravanapriyan Sriraman | 2017-05-02 |
| 9275869 | Fast-gas switching for etching | Saravanapriyan Sriraman | 2016-03-01 |
| 9053908 | Method and apparatus for controlling substrate DC-bias and ion energy and angular distribution during substrate etching | Saravanapriyan Sriraman | 2015-06-09 |
| 8475625 | Apparatus for etching high aspect ratio features | Sharma Pamarthy, Huutri Dao, Xiaoping Zhou, Kelly A. McDonough, Jivko Dinev +9 more | 2013-07-02 |
| 8440473 | Use of spectrum to synchronize RF switching with gas switching during etch | Qing Xu, Camelia Rusu, Brian McMillin | 2013-05-14 |
| 8383002 | Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection | Dan Katz, David Palagashvili, Michael D. Willwerth, Valentin N. Todorow | 2013-02-26 |
| 8236133 | Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias | Dan Katz, David Palagashvili, Brian K. Hatcher, Theodoros Panagopoulos, Valentin N. Todorow +2 more | 2012-08-07 |
| 8066895 | Method to control uniformity using tri-zone showerhead | Rodolfo P. Belen, Edward P. Hammond, IV, Brian K. Hatcher, Dan Katz, Valentin N. Todorow | 2011-11-29 |
| 8017526 | Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process | Edward P. Hammond, IV, Rodolfo P. Belen, Brian K. Hatcher, Valentin N. Todorow, Dan Katz | 2011-09-13 |
| 7879250 | Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection | Dan Katz, David Palagashvili, Michael D. Willwerth, Valentin N. Todorow | 2011-02-01 |
| 7838430 | Plasma control using dual cathode frequency mixing | Steven C. Shannon, Dennis S. Grimard, Theodoros Panagopoulos, Daniel J. Hoffman, Michael G. Chafin +4 more | 2010-11-23 |
| 7832354 | Cathode liner with wafer edge gas injection in a plasma reactor chamber | Dan Katz, David Palagashvili, Michael D. Willwerth, Valentin N. Todorow | 2010-11-16 |
| 7780864 | Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution | Valentin N. Todorow, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +2 more | 2010-08-24 |
| 7777152 | High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck | Valentin Todorov, Michael D. Willwerth, Brian K. Hatcher, James E. Sammons, III, John Holland | 2010-08-17 |
| 7771606 | Pulsed-plasma system with pulsed reaction gas replenish for etching semiconductors structures | Tae Won Kim, Kyeong-Tae Lee, Valentin N. Todorow, Shashank Deshmukh | 2010-08-10 |
| 7737042 | Pulsed-plasma system for etching semiconductor structures | Tae Won Kim, Kyeong-Tae Lee, Valentin N. Todorow, Shashank Deshmukh | 2010-06-15 |
| 7727413 | Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density | Valentin N. Todorow, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +2 more | 2010-06-01 |
| 7718538 | Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates | Tae Won Kim, Kyeong-Tae Lee, Valentin Todorov, Shashank Deshmukh | 2010-05-18 |
| 7674394 | Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution | Valentin Todorov, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +1 more | 2010-03-09 |
| 7645357 | Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency | Valentin N. Todorow, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +2 more | 2010-01-12 |
| 7510665 | Plasma generation and control using dual frequency RF signals | Steven C. Shannon, Theodoros Panagopoulos, John Holland, Dennis S. Grimard, Daniel J. Hoffman | 2009-03-31 |
| 7264688 | Plasma reactor apparatus with independent capacitive and toroidal plasma sources | Valentin N. Todorow, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +2 more | 2007-09-04 |
| 6962644 | Tandem etch chamber plasma processing system | Valentin Todorov, Jon McChesney, Gerhard Schneider, David Palagashvili, John Holland +1 more | 2005-11-08 |
| 6706138 | Adjustable dual frequency voltage dividing plasma reactor | Michael Barnes, John Holland, Valentin Todorov, Farhad Moghadam | 2004-03-16 |