Issued Patents All Time
Showing 25 most recent of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8871586 | Methods of reducing material loss in isolation structures by introducing inert atoms into oxide hard mask layer used in growing channel semiconductor material | Thilo Scheiper, Jan Hoentschel, Markus Lenski | 2014-10-28 |
| 8846513 | Semiconductor device comprising replacement gate electrode structures and self-aligned contact elements formed by a late contact fill | Peter Baars, Richard J. Carter | 2014-09-30 |
| 8796807 | Temperature monitoring in a semiconductor device by using a PN junction based on silicon/germanium materials | Markus Forsberg, Gert Burbach, Anthony Mowry | 2014-08-05 |
| 8735236 | High-k metal gate electrode structure formed by removing a work function on sidewalls in replacement gate technology | Klaus Hempel, Christopher M. Prindle | 2014-05-27 |
| 8293610 | Semiconductor device comprising a metal gate stack of reduced height and method of forming the same | Sven Beyer, Martin Trentzsch, Patrick Press | 2012-10-23 |
| 8288256 | Enhancing transistor characteristics by a late deep implantation in combination with a diffusion-free anneal process | Thomas Feudel, Manfred Horstmann | 2012-10-16 |
| 8158065 | In situ monitoring of metal contamination during microstructure processing | Martin Trentzsch, Stephan Kronholz | 2012-04-17 |
| 8119461 | Reducing the creation of charge traps at gate dielectrics in MOS transistors by performing a hydrogen treatment | Martin Trentzsch, Thorsten Kammler | 2012-02-21 |
| 8003460 | Method of forming a semiconductor structure comprising a formation of at least one sidewall spacer structure | Frank Wirbeleit, Peter Javorka | 2011-08-23 |
| 7745334 | Technique for locally adapting transistor characteristics by using advanced laser/flash anneal techniques | Patrick Press, Karla Romero, Martin Trentzsch, Karsten Wieczorek, Thomas Feudel +1 more | 2010-06-29 |
| 7727827 | Method of forming a semiconductor structure | Frank Wirbeleit, Manfred Horstmann | 2010-06-01 |
| 7629211 | Field effect transistor and method of forming a field effect transistor | Sven Beyer, Thorsten Kammler, Manfred Horstmann | 2009-12-08 |
| 7625802 | Semiconductor device having improved halo structures and a method of forming the halo structures of a semiconductor device | Thomas Feudel, Manfred Horstmann | 2009-12-01 |
| 7608499 | Semiconductor structure comprising field effect transistors with stressed channel regions and method of forming the same | Karla Romero, Sven Beyer, Jan Hoentschel | 2009-10-27 |
| 7605045 | Field effect transistors and methods for fabricating the same | Igor Peidous, Patrick Press | 2009-10-20 |
| 7563731 | Field effect transistor having a stressed dielectric layer based on an enhanced device topography | Christoph Schwan, Manfred Horstmann, Kai Frohberg | 2009-07-21 |
| 7325224 | Method and system for increasing product yield by controlling lithography on the basis of electrical speed data | Rolf Seltmann, Heiko Wagner | 2008-01-29 |
| 7297994 | Semiconductor device having a retrograde dopant profile in a channel region | Karsten Wieczorek, Manfred Horstmann | 2007-11-20 |
| 7238578 | Method of forming a semiconductor structure comprising transistor elements with differently stressed channel regions | Gert Burbach, Karsten Wieczorek, Manfred Horstmann | 2007-07-03 |
| 7226859 | Method of forming different silicide portions on different silicon-containing regions in a semiconductor device | Karsten Wieczorek, Manfred Horstmann | 2007-06-05 |
| 7217657 | Semiconductor device having different metal silicide portions and method for fabricating the semiconductor device | Karsten Wieczorek, Manfred Horstmann | 2007-05-15 |
| 7148145 | Semiconductor device having T-shaped gate structure comprising in situ sidewall spacers and method of forming the semiconductor device | Karsten Wieczorek, Manfred Horstmann | 2006-12-12 |
| 7115464 | Semiconductor device having different metal-semiconductor portions formed in a semiconductor region and a method for fabricating the semiconductor device | Manfred Horstmann, Karsten Wieczorek | 2006-10-03 |
| 7041583 | Method of removing features using an improved removal process in the fabrication of a semiconductor device | Karsten Wieczorek, Manfred Horstmann | 2006-05-09 |
| 6924216 | Semiconductor device having improved doping profiles and method of improving the doping profiles of a semiconductor device | Thomas Feudel, Manfred Horstmann | 2005-08-02 |