Rolf Seltmann — 13 Patents at AMD

Rolf Seltmann has been granted 13 US patents while listed as an inventor at AMD. The first was granted in 1996 and the most recent in May 2018. Rolf Seltmann ranks #362,438 of 4,157,543 US inventors in our database (top 8.7%). Patent records list Rolf Seltmann in Radebeul, DE.

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
9966315	Advanced process control methods for process-aware dimension targeting	Philipp Jaschinsky, Frank Kahlenberg, Sirko Kramp, Roberto Schiwon	2018-05-08	$5,480,000
8605250	Method and system for detecting particle contamination in an immersion lithography tool	Rene Wirtz	2013-12-10	$2,962,000
8332783	Control of critical dimensions in optical imaging processes for semiconductor production by extracting imaging imperfections on the basis of imaging tool specific intensity measurements and simulations	Stefan Roling, Francois Weisbuch	2012-12-11	$1,376,000
8155770	Method and apparatus for dispatching workpieces to tools based on processing and performance history	Robert Barlovic, Uwe Schulze, Jan Raebiger, Joerg Weigang, Jens Busch	2012-04-10	$5,913,000
8039181	Method and system for reducing overlay errors in semiconductor volume production using a mixed tool scenario	Jens Busch, Uwe Schulze	2011-10-18	$1,986,000
7842442	Method and system for reducing overlay errors within exposure fields by APC control strategies	Bernd Schulz, Fritjof Hempel, Uwe Schulze	2010-11-30	$11,033,000
7618755	Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields	Uwe Schulze, Jens Krause	2009-11-17	$39,002,000
7325224	Method and system for increasing product yield by controlling lithography on the basis of electrical speed data	Heiko Wagner, Rolf Stephan	2008-01-29	$10,637,000
7006195	Method and system for improving exposure uniformity in a step and repeat process	Jan Raebiger, Heiko Wagner, Uwe Schulze	2006-02-28	$11,043,000
6946411	Method and system for improving the efficiency of a mechanical alignment tool	Uwe Knappe, Jan Raebiger, Uwe Schulze	2005-09-20	$11,506,000
6493063	Critical dimension control improvement method for step and scan photolithography	Anna M. Minvielle	2002-12-10	$2,246,000
5936713	Method and device for producing features on a photolithographic layer	Jorg Paufler, Heinz Kück	1999-08-10
5496669	System for detecting a latent image using an alignment apparatus	Rainer Pforr, Steve Wittekoek	1996-03-05

Rolf Seltmann — 13 Patents

Issued Patents All Time

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