Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10157804 | Method and apparatus for determining a critical dimension variation of a photolithographic mask | — | 2018-12-18 |
| 8871409 | Lithographic targets for uniformity control | Guy Ben-Zvi, Vladimir Dmitriev, Erez Graitzer | 2014-10-28 |
| 8539394 | Method and apparatus for minimizing overlay errors in lithography | — | 2013-09-17 |
| 8293431 | Lithographic mask and method of forming a lithographic mask | Haiko Rolff, Carla Byloos, Christoph Noelscher, Nicolo Morgana, Roderick Koehle +3 more | 2012-10-23 |
| 7855776 | Methods of compensating lens heating, lithographic projection system and photo mask | Bernd Kuechler, Thomas Muelders | 2010-12-21 |
| 7644389 | Method for producing a mask for the lithographic projection of a pattern onto a substrate | Mario Hennig, Gerd Unger | 2010-01-05 |
| 7588867 | Reflection mask, use of the reflection mask and method for fabricating the reflection mask | Frank-Michael Kamm, Christian Crell | 2009-09-15 |
| 7489386 | System and method for projecting a pattern from a mask onto a substrate | Frank-Michael Kamm | 2009-02-10 |
| 7425396 | Method for reducing an overlay error and measurement mark for carrying out the same | Stefan Gruss, Detlef Hofmann, Mario Hennig, Guido Thielscher, Hans-Georg Froehlich | 2008-09-16 |
| 7393613 | Set of at least two masks for the projection of structure patterns | Wolfgang Dettmann, Jorg Thiele, Mario Hennig, Karsten Zeiler | 2008-07-01 |
| 7393614 | Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer | Roderick Köhle, Jorg Thiele, Wolfgang Dettmann, Markus Hofsäss, Mario Hennig | 2008-07-01 |
| 7354683 | Lithography mask for imaging of convex structures | Molela Moukara, Burkhard Ludwig, Jorg Thiele, Marco Ahrens, Roderick Köhle +1 more | 2008-04-08 |
| 7339652 | Apparatus for projecting a pattern into an image plane | Molela Moukara, Thomas Muelders, Mario Hennig, Karsten Zeiler | 2008-03-04 |
| 6838216 | Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatus | Uwe Griesinger, Mario Hennig, Jurgen Knobloch, Manuel Vorwerk | 2005-01-04 |
| 6692875 | Mask for optical projection systems, and a process for its production | Werner Fischer, Fritz Gans, Jorg Thiele | 2004-02-17 |
| 6660437 | Alternating phase mask | Christoph Friedrich, Uwe Griesinger, Michael Heissmeier, Burkhard Ludwig, Molela Moukara | 2003-12-09 |
| 6635388 | Contact hole fabrication with the aid of mutually crossing sudden phase shift edges of a single phase shift mask | Christoph Friedrich, Uwe Griesinger, Dietrich Widmann, Andreas Grassmann | 2003-10-21 |
| 6627392 | Method of transferring a pattern of high structure density by multiple exposure of less dense partial patterns | Fritz Gans | 2003-09-30 |
| 6466373 | Trimming mask with semitransparent phase-shifting regions | Christoph Friedrich, Klaus Ergenzinger, Fritz Gans, Uwe Griesinger, Wilhelm Maurer +1 more | 2002-10-15 |
| 5624773 | Resolution-enhancing optical phase structure for a projection illumination system | Kurt G. M. Ronse, Rik Jonckheere, Luc M. M. L. Van Den Hove | 1997-04-29 |
| 5496669 | System for detecting a latent image using an alignment apparatus | Steve Wittekoek, Rolf Seltmann | 1996-03-05 |