Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7644389 | Method for producing a mask for the lithographic projection of a pattern onto a substrate | Rainer Pforr, Gerd Unger | 2010-01-05 |
| 7425396 | Method for reducing an overlay error and measurement mark for carrying out the same | Stefan Gruss, Detlef Hofmann, Rainer Pforr, Guido Thielscher, Hans-Georg Froehlich | 2008-09-16 |
| 7393614 | Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer | Roderick Köhle, Rainer Pforr, Jorg Thiele, Wolfgang Dettmann, Markus Hofsäss | 2008-07-01 |
| 7393613 | Set of at least two masks for the projection of structure patterns | Wolfgang Dettmann, Jorg Thiele, Rainer Pforr, Karsten Zeiler | 2008-07-01 |
| 7339652 | Apparatus for projecting a pattern into an image plane | Molela Moukara, Rainer Pforr, Thomas Muelders, Karsten Zeiler | 2008-03-04 |
| 7045254 | Mask with programmed defects and method for the fabrication thereof | Wolfgang Dettmann, Gunter Antesberger, Jan Heumann | 2006-05-16 |
| 6838216 | Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatus | Uwe Griesinger, Jurgen Knobloch, Rainer Pforr, Manuel Vorwerk | 2005-01-04 |