| 9303318 |
Multiple complementary gas distribution assemblies |
Tuoh Bin Ng, Yuriy Melnik, Eda Tuncel, Lu Chen, Son T. Nguyen |
2016-04-05 |
| 8568529 |
HVPE chamber hardware |
Tetsuya Ishikawa, David H. Quach, Anzhong Chang, Olga Kryliouk, Yuriy Melnik +2 more |
2013-10-29 |
| 8491720 |
HVPE precursor source hardware |
Tetsuya Ishikawa, David H. Quach, Anzhong Chang, Olga Kryliouk, Yuriy Melnik +2 more |
2013-07-23 |
| 8317970 |
Ceiling electrode with process gas dispersers housing plural inductive RF power applicators extending into the plasma |
Canfeng Lai, Majeed A. Foad |
2012-11-27 |
| D664172 |
Dome assembly for a deposition chamber |
Tetsuya Ishikawa, David H. Quach, Anzhong Chang, Olga Kryliouk, Yuriy Melnik +2 more |
2012-07-24 |
| 8183132 |
Methods for fabricating group III nitride structures with a cluster tool |
Sandeep Nijhawan, Brian H. Burrows, Tetsuya Ishikawa, Olga Kryliouk, Anand Vasudev +6 more |
2012-05-22 |
| 7691755 |
Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor |
Shijian Li, Majeed A. Foad, Seon-Mee Cho |
2010-04-06 |
| 7520939 |
Integrated bevel clean chamber |
Henry Ho, Anh N. Nguyen, Alexander Lerner |
2009-04-21 |
| 7497026 |
Method and system for detection of wafer centering in a track lithography tool |
Harald Herchen, Erica Porras |
2009-03-03 |
| 7285195 |
Electric field reducing thrust plate |
Harald Herchen, Dmitry Lubomirsky, Bo Zheng |
2007-10-23 |
| 7223323 |
Multi-chemistry plating system |
Michael Yang, Ming Xi, Russell C. Ellwanger, Eric Bramwell Britcher, Bernardo Donoso +11 more |
2007-05-29 |
| 6958098 |
Semiconductor wafer support lift-pin assembly |
Rudolf Gujer, Thomas Cho, Michael P. Karazim, Tetsuya Ishikawa |
2005-10-25 |
| 6572708 |
Semiconductor wafer support lift-pin assembly |
Rudolf Gujer, Thomas Cho, Michael P. Karazim, Tetsuya Ishikawa |
2003-06-03 |
| 6517634 |
Chemical vapor deposition chamber lid assembly |
Thomas Cho, Tetsuya Ishikawa |
2003-02-11 |
| 6486081 |
Gas distribution system for a CVD processing chamber |
Tetsuya Ishikawa, Padmanabhan Krishnaraj, Feng Gao, Alan W. Collins |
2002-11-26 |
| 6450117 |
Directing a flow of gas in a substrate processing chamber |
Laxman Murugesh, Padmanaban Krishnaraj, Michael S. Cox, Canfeng Lai, Narendra Dubey +2 more |
2002-09-17 |
| 6364958 |
Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges |
Canfeng Lai, Michael S. Cox, Michael Barnes |
2002-04-02 |
| 6363624 |
Apparatus for cleaning a semiconductor process chamber |
Thomas Cho, Tetsuya Ishikawa |
2002-04-02 |
| 6143078 |
Gas distribution system for a CVD processing chamber |
Tetsuya Ishikawa, Padmanabhan Krishnaraj, Feng Gao, Alan W. Collins |
2000-11-07 |
