Issued Patents All Time
Showing 1–25 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11175589 | Automatic wavelength or angle pruning for optical metrology | Lie-Quan Lee | 2021-11-16 |
| 10895810 | Automatic selection of sample values for optical metrology | Meng Cao, Inkyo Kim, Lie-Quan Lee | 2021-01-19 |
| 10770362 | Dispersion model for band gap tracking | Natalia Malkova, Ming Di, Qiang Zhao, Dawei Hu | 2020-09-08 |
| 10648793 | Library expansion system, method, and computer program product for metrology | Liequan Lee | 2020-05-12 |
| 10605722 | Metrology system calibration refinement | Hidong Kwak, John Lesoine, Malik Sadiq, Lanhua Wei, Shankar Krishnan +1 more | 2020-03-31 |
| 10481088 | Automatic determination of fourier harmonic order for computation of spectral information for diffraction structures | Mark Backues, Paul Aoyagi | 2019-11-19 |
| 10410935 | Dispersion model for band gap tracking | Natalia Malkova, Ming Di, Qiang Zhao, Dawei Hu | 2019-09-10 |
| 10393647 | System, method, and computer program product for automatically determining a parameter causing an abnormal semiconductor metrology measurement | Qiang Zhao, Liequan Lee, Jonathan Iloreta, Hong Qiu | 2019-08-27 |
| 10386729 | Dynamic removal of correlation of highly correlated parameters for optical metrology | Lie-Quan Lee, Stilian Ivanov Pandev | 2019-08-20 |
| 10345095 | Model based measurement systems with improved electromagnetic solver performance | Stilian Ivanov Pandev, Dzmitry Sanko, Andrei V. Shchegrov | 2019-07-09 |
| 10190868 | Metrology system, method, and computer program product employing automatic transitioning between utilizing a library and utilizing regression for measurement processing | Liequan Lee, Raphael Jean Michel Marie Getin, Meng Cao, Torsten R. Kaack, Hong Qiu | 2019-01-29 |
| 10151986 | Signal response metrology based on measurements of proxy structures | Andrei V. Shchegrov, Thaddeus Gerard Dziura, Stilian Ivanov Pandev | 2018-12-11 |
| 10088413 | Spectral matching based calibration | Hidong Kwak, Zhiming Jiang, Ward Dixon, Kenneth Edward James, Jr., Torsten R. Kaack | 2018-10-02 |
| 10079183 | Calculated electrical performance metrics for process monitoring and yield management | Xiang Gao, Philip D. Flanner, III, Ming Di, Qiang Zhao, Scott Penner | 2018-09-18 |
| 10006865 | Confined illumination for small spot size metrology | Derrick Shaughnessy, Michael S. Bakeman, Guorong V. Zhuang, Andrei V. Shchegrov | 2018-06-26 |
| 9915522 | Optimized spatial modeling for optical CD metrology | Peilin Jiang | 2018-03-13 |
| 9903711 | Feed forward of metrology data in a metrology system | Ady Levy, Daniel Kandel, Michael Adel, John Robinson, Tal Marciano +9 more | 2018-02-27 |
| 9857291 | Metrology system calibration refinement | Hidong Kwak, John Lesoine, Malik Sadiq, Lanhua Wei, Shankar Krishnan +1 more | 2018-01-02 |
| 9719932 | Confined illumination for small spot size metrology | Derrick Shaughnessy, Michael S. Bakeman, Guorong V. Zhuang, Andrei V. Shchegrov | 2017-08-01 |
| 9664734 | Multi-oscillator, continuous Cody-Lorentz model of optical dispersion | Natalia Malkova | 2017-05-30 |
| 9625823 | Calculation method for local film stress measurements using local film thickness values | Torsten R. Kaack, Yu Tay | 2017-04-18 |
| 9607265 | Accurate and fast neural network training for library-based critical dimension (CD) metrology | Wen Jin, Vi Vuong, Junwei Bao, Lie-Quan Lee | 2017-03-28 |
| 9595481 | Dispersion model for band gap tracking | Natalia Malkova, Ming Di, Qiang Zhao, Dawei Hu | 2017-03-14 |
| 9559019 | Metrology through use of feed forward feed sideways and measurement cell re-use | Michael Adel, John Fielden, John Ernst Nielsen Madsen, Robert W. Peters | 2017-01-31 |
| 9553033 | Semiconductor device models including re-usable sub-structures | Jonathan Iloreta, Matthew A. Laffin, Torsten R. Kaack, Qiang Zhao, Lie-Quan Lee | 2017-01-24 |