SG

Stephan Grunow

IBM: 28 patents #3,676 of 70,183Top 6%
TI Texas Instruments: 15 patents #889 of 12,488Top 8%
AM AMD: 3 patents #3,141 of 9,279Top 35%
CM Chartered Semiconductor Manufacturing: 1 patents #419 of 840Top 50%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
Samsung: 1 patents #49,284 of 75,807Top 70%
📍 Poughkeepsie, NY: #81 of 1,613 inventorsTop 6%
🗺 New York: #2,285 of 115,490 inventorsTop 2%
Overall (All Time): #68,111 of 4,157,543Top 2%
44
Patents All Time

Issued Patents All Time

Showing 26–44 of 44 patents

Patent #TitleCo-InventorsDate
7737528 Structure and method of forming electrically blown metal fuses for integrated circuits Griselda Bonilla, Kaushik Chanda, Ronald G. Filippi, Jeffrey P. Gambino, Chao-Kun Hu +3 more 2010-06-15
7674707 Manufacturable reliable diffusion-barrier Noel Russell, Satyavolu S. Papa Rao 2010-03-09
7671362 Test structure for determining optimal seed and liner layer thicknesses for dual damascene processing Tibor Bolom, Kaushik Chanda, Ronald G. Filippi, Paul S. McLaughlin, Sujatha Sankaran +3 more 2010-03-02
7642619 Air gap in integrated circuit inductor fabrication Phillip D. Matz, Satyavolu S. Papa Rao 2010-01-05
7629264 Structure and method for hybrid tungsten copper metal contact Griselda Bonilla, Kaushik A. Kumar, Lawrence A. Clevenger, Kevin S. Petrarca, Roger A. Quon 2009-12-08
7566627 Air gap in integrated circuit inductor fabrication Phillip D. Matz, Satyavolu Srinivas Papa Rao 2009-07-28
7517736 Structure and method of chemically formed anchored metallic vias Sanjay C. Mehta, Daniel C. Edelstein, John A. Fitzsimmons, Henry A. Nye, III, David L. Rath 2009-04-14
7485963 Use of supercritical fluid for low effective dielectric constant metallization Satyavolu S. Papa Rao, Phillip D. Matz 2009-02-03
7456099 Method of forming a structure for reducing lateral fringe capacitance in semiconductor devices Lawrence A. Clevenger, Kaushik A. Kumar, Kevin S. Petrarca, Vidhya Ramachandran, Theodorus E. Standaert 2008-11-25
7446036 Gap free anchored conductor and dielectric structure and method for fabrication thereof Tibor Bolom, David L. Rath, Andrew H. Simon 2008-11-04
7338893 Integration of pore sealing liner into dual-damascene methods and devices Edward R. Engbrecht, Satyavolu Srinivas Papa Rao, Sameer Ajmera 2008-03-04
7256121 Contact resistance reduction by new barrier stack process Duofeng Yue, Satyavolu Srinivas Papa Rao, Noel Russell, Montray Leavy 2007-08-14
7189615 Single mask MIM capacitor and resistor with in trench copper drift barrier Satyavolu Srinivas Papa Rao, Darius Crenshaw, Kenneth D. Brennan, Somit Joshi, Montray Leavy +3 more 2007-03-13
7179747 Use of supercritical fluid for low effective dielectric constant metallization Satyavolu S. Papa Rao, Phillip D. Matz 2007-02-20
7148140 Partial plate anneal plate process for deposition of conductive fill material Montray Leavy, Satyavolu Srinivas Papa Rao, Noel Russell 2006-12-12
7115467 Metal insulator metal (MIM) capacitor fabrication with sidewall barrier removal aspect Sameer Ajmera, Darius Crenshaw, Satyavolu S. Papa Rao, Phillip D. Matz 2006-10-03
7037837 Method of fabricating robust nucleation/seed layers for subsequent deposition/fill of metallization layers Satyavolu S. Papa Rao, Noel Russell 2006-05-02
6900127 Multilayer integrated circuit copper plateable barriers Satyavolu S. Papa Rao, Noel Russell 2005-05-31
6864108 Measurement of wafer temperature in semiconductor processing chambers Satyavolu S. Papa Rao, Noel Russell 2005-03-08