Issued Patents All Time
Showing 51–75 of 86 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9502307 | Forming a semiconductor structure for reduced negative bias temperature instability | Ruqiang Bao | 2016-11-22 |
| 9484427 | Field effect transistors having multiple effective work functions | Takashi Ando, Min Dai, Balaji Kannan, Unoh Kwon | 2016-11-01 |
| 9472419 | Method of patterning dopant films in high-K dielectrics in a soft mask integration scheme | Takashi Ando, Hemanth Jagannathan, Balaji Kannan, Unoh Kwon, Rekha Rajaram | 2016-10-18 |
| 9412658 | Constrained nanosecond laser anneal of metal interconnect structures | Oleg Gluschenkov, Joyeeta Nag, Andrew H. Simon, Shishir Ray | 2016-08-09 |
| 9397177 | Variable length multi-channel replacement metal gate including silicon hard mask | Michael P. Chudzik, Unoh Kwon | 2016-07-19 |
| 9397199 | Methods of forming multi-Vt III-V TFET devices | Unoh Kwon, Vijay Narayanan, Jeffrey W. Sleight | 2016-07-19 |
| 9373690 | Variable length multi-channel replacement metal gate including silicon hard mask | Michael P. Chudzik, Unoh Kwon | 2016-06-21 |
| 9330938 | Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme | Takashi Ando, Hemanth Jagannathan, Balaji Kannan, Unoh Kwon, Rekha Rajaram | 2016-05-03 |
| 9318336 | Non-volatile memory structure employing high-k gate dielectric and metal gate | Nicolas L. Breil, Michael P. Chudzik, Rishikesh Krishnan, Unoh Kwon | 2016-04-19 |
| 9099394 | Non-volatile memory structure employing high-k gate dielectric and metal gate | Nicolas L. Breil, Michael P. Chudzik, Rishikesh Krishnan, Unoh Kwon | 2015-08-04 |
| 9087722 | Semiconductor devices having different gate oxide thicknesses | Charlotte DeWan Adams, Michael P. Chudzik, Unoh Kwon, Shahab Siddiqui | 2015-07-21 |
| 9087784 | Structure and method of Tinv scaling for high k metal gate technology | Michael P. Chudzik, Dechao Guo, Unoh Kwon, Carl Radens, Shahab Siddiqui | 2015-07-21 |
| 9087927 | Thermally stable high-K tetragonal HFO2 layer within high aspect ratio deep trenches | Michael P. Chudzik, Bachir Dirahoui, Rishikesh Krishnan, Oh-Jung Kwon, Paul C. Parries +1 more | 2015-07-21 |
| 9059315 | Concurrently forming nFET and pFET gate dielectric layers | Takashi Ando, MaryJane Brodsky, Michael P. Chudzik, Min Dai, Joseph F. Shepard, Jr. +2 more | 2015-06-16 |
| 9006837 | Structure and method of Tinv scaling for high k metal gate technology | Michael P. Chudzik, Dechao Guo, Unoh Kwon, Carl Radens, Shahab Siddiqui | 2015-04-14 |
| 8952460 | Germanium oxide free atomic layer deposition of silicon oxide and high-k gate dielectric on germanium containing channel for CMOS devices | MaryJane Brodsky, Murshed Chowdhury, Michael P. Chudzik, Min Dai, Shreesh Narasimha +1 more | 2015-02-10 |
| 8941177 | Semiconductor devices having different gate oxide thicknesses | Charlotte DeWan Adams, Michael P. Chudzik, Unoh Kwon, Shahab Siddiqui | 2015-01-27 |
| 8912607 | Replacement metal gate structures providing independent control on work function and gate leakage current | Unoh Kwon, Ramachandra Divakaruni, Ravikumar Ramachandran | 2014-12-16 |
| 8901706 | Thermally stable high-K tetragonal HFO2 layer within high aspect ratio deep trenches | Michael P. Chudzik, Bachir Dirahoui, Rishikesh Krishnan, Oh-Jung Kwon, Paul C. Parries +1 more | 2014-12-02 |
| 8809152 | Germanium oxide free atomic layer deposition of silicon oxide and high-k gate dielectric on germanium containing channel for CMOS devices | MaryJane Brodsky, Murshed Chowdhury, Michael P. Chudzik, Min Dai, Shreesh Narasimha +1 more | 2014-08-19 |
| 8809176 | Replacement gate with reduced gate leakage current | Takashi Ando, Michael P. Chudzik, Rishikesh Krishnan, Unoh Kwon, Keith Kwong Hon Wong | 2014-08-19 |
| 8778750 | Techniques for the fabrication of thick gate dielectric | Eduard A. Cartier, Michael P. Chudzik, Andreas Kerber, Naim Moumen | 2014-07-15 |
| 8759172 | Etch stop layer formation in metal gate process | Zhengwen Li, Michael P. Chudzik, Ramachandra Divakaruni, Unoh Kwon, Richard S. Wise | 2014-06-24 |
| 8643115 | Structure and method of Tinv scaling for high κ metal gate technology | Michael P. Chudzik, Dechao Guo, Unoh Kwon, Carl Radens, Shahab Siddiqui | 2014-02-04 |
| 8592325 | Insulating layers on different semiconductor materials | Joseph F. Shepard, Jr., Rishikesh Krishnan, Michael P. Chudzik | 2013-11-26 |