Issued Patents All Time
Showing 26–50 of 78 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11192101 | Method to create multilayer microfluidic chips using spin-on carbon as gap filling materials | Chi-Chun Liu, Yann Mignot, Joshua T. Smith, Bassem M. Hamieh, Robert L. Bruce | 2021-12-07 |
| 11177130 | Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography | Ekmini Anuja De Silva, Dario L. Goldfarb, Daniel A. Corliss, Rudy J. Wojtecki | 2021-11-16 |
| 11171002 | Alternating hardmasks for tight-pitch line formation | John C. Arnold, Anuja E. DeSilva, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg | 2021-11-09 |
| 11164772 | Spacer-defined process for lithography-etch double patterning for interconnects | Ekmini Anuja De Silva, Luciana Meli Thompson, Yann Mignot | 2021-11-02 |
| 11131919 | Extreme ultraviolet (EUV) mask stack processing | Yongan Xu, Zhenxing Bi, Yann Mignot, Ekmini Anuja De Silva | 2021-09-28 |
| 11133260 | Self-aligned top via | Chi-Chun Liu, John C. Arnold, Dominik Metzler, Ashim Dutta | 2021-09-28 |
| 11133195 | Inverse tone pillar printing method using polymer brush grafts | Ekmini Anuja De Silva, Praveen Joseph, Ashim Dutta | 2021-09-28 |
| 11121024 | Tunable hardmask for overlayer metrology contrast | Ekmini Anuja De Silva, Indira Seshadri, Stuart A. Sieg | 2021-09-14 |
| 11084032 | Method to create multilayer microfluidic chips using spin-on carbon as gap fill and spin-on glass tone inversion | Chi-Chun Liu, Yann Mignot, Joshua T. Smith, Bassem M. Hamieh, Robert L. Bruce | 2021-08-10 |
| 11067896 | Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay | Cody J. Murray, Ekmini Anuja De Silva, Alex Richard Hubbard, Karen E. Petrillo | 2021-07-20 |
| 11054250 | Multi-channel overlay metrology | Gangadhara Raja Muthinti, Chiew-Seng Koay, Siva Kanakasabapathy | 2021-07-06 |
| 11037786 | Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography | Ekmini Anuja De Silva, Dario L. Goldfarb, Daniel A. Corliss, Rudy J. Wojtecki | 2021-06-15 |
| 11031248 | Alternating hardmasks for tight-pitch line formation | Sean D. Burns, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg | 2021-06-08 |
| 11018007 | Self aligned pattern formation post spacer etchback in tight pitch configurations | Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Christopher J. Penny +2 more | 2021-05-25 |
| 10998192 | Sequential infiltration synthesis extreme ultraviolet single expose patterning | Ekmini Anuja De Silva, Jing Guo, Luciana Meli | 2021-05-04 |
| 10950440 | Patterning directly on an amorphous silicon hardmask | Abraham Arceo de la Pena, Ekmini Anuja De Silva | 2021-03-16 |
| 10831102 | Photoactive polymer brush materials and EUV patterning using the same | Ekmini Anuja De Silva, Rudy J. Wojtecki, Dario L. Goldfarb, Daniel P. Sanders | 2020-11-10 |
| 10768532 | Co-optimization of lithographic and etching processes with complementary post exposure bake by laser annealing | Jing Sha, Ekmini Anuja De Silva, Derren N. Dunn | 2020-09-08 |
| 10755928 | Fabricating electrically nonconductive blocks using a polymer brush and a sequential infiltration synthesis process | Chi-Chun Liu, Kristin Schmidt, Yann Mignot, Martha I. Sanchez, Daniel P. Sanders +1 more | 2020-08-25 |
| 10755926 | Patterning directly on an amorphous silicon hardmask | Abraham Arceo de la Pena, Ekmini Anuja De Silva | 2020-08-25 |
| 10748823 | Embedded etch rate reference layer for enhanced etch time precision | Yann Mignot, Alan C. Thomas, Daniel P. Sanders, Dario L. Goldfarb, Chi-Chun Liu +1 more | 2020-08-18 |
| 10741454 | Boundary protection for CMOS multi-threshold voltage devices | Jing Guo, Ekmini Anuja De Silva, Nicolas Loubet, Indira Seshadri | 2020-08-11 |
| 10727055 | Method to increase the lithographic process window of extreme ultra violet negative tone development resists | Martin Glodde, Dario L. Goldfarb | 2020-07-28 |
| 10656527 | Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer | Ekmini Anuja De Silva, Indira Seshadri, Jing Guo, Ashim Dutta | 2020-05-19 |
| 10658521 | Enabling residue free gap fill between nanosheets | Indira Seshadri, Ekmini Anuja De Silva, Jing Guo, Ruqiang Bao, Muthumanickam Sankarapandian | 2020-05-19 |