Issued Patents All Time
Showing 51–75 of 78 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10622248 | Tunable hardmask for overlayer metrology contrast | Ekmini Anuja De Silva, Indira Seshadri, Stuart A. Sieg | 2020-04-14 |
| 10586697 | Wet strippable OPL using reversible UV crosslinking and de-crosslinking | Ekmini Anuja De Silva, Jing Guo, Indira Seshadri | 2020-03-10 |
| 10580652 | Alternating hardmasks for tight-pitch line formation | John C. Arnold, Anuja E. DeSilva, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg | 2020-03-03 |
| 10578981 | Post-lithography defect inspection using an e-beam inspection tool | Luciana Meli Thompson, Ekmini Anuja De Silva, Yasir Sulehria | 2020-03-03 |
| 10545409 | Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay | Cody J. Murray, Ekmini Anuja De Silva, Alex Richard Hubbard, Karen E. Petrillo | 2020-01-28 |
| 10529569 | Self aligned pattern formation post spacer etchback in tight pitch configurations | Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Christopher J. Penny +2 more | 2020-01-07 |
| 10437951 | Care area generation by detection optimized methodology | Ravi K. Bonam, Scott D. Halle, Luciana Meli | 2019-10-08 |
| 10410875 | Alternating hardmasks for tight-pitch line formation | Sean D. Burns, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg | 2019-09-10 |
| 10388521 | Method to increase the lithographic process window of extreme ultra violet negative tone development resists | Martin Glodde, Dario L. Goldfarb | 2019-08-20 |
| 10388510 | Wet strippable OPL using reversible UV crosslinking and de-crosslinking | Ekmini Anuja De Silva, Jing Guo, Indira Seshadri | 2019-08-20 |
| 10354922 | Simplified block patterning with wet strippable hardmask for high-energy implantation | Ekmini Anuja De Silva, Indira Seshadri, Romain Lallement | 2019-07-16 |
| 10347486 | Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography | Ekmini Anuja De Silva, Dario L. Goldfarb, Daniel A. Corliss, Rudy J. Wojtecki | 2019-07-09 |
| 10312103 | Alternating hardmasks for tight-pitch line formation | Sean D. Burns, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg | 2019-06-04 |
| 10249512 | Tunable TiOxNy hardmask for multilayer patterning | Abraham Arceo de la Pena, Ekmini Anuja De Silva, Sivananda K. Kanakasabapathy | 2019-04-02 |
| 10121661 | Self aligned pattern formation post spacer etchback in tight pitch configurations | Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Christopher J. Penny +2 more | 2018-11-06 |
| 10103022 | Alternating hardmasks for tight-pitch line formation | John C. Arnold, Anuja E. DeSilva, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg | 2018-10-16 |
| 10056290 | Self-aligned pattern formation for a semiconductor device | Sean D. Burns, Lawrence A. Clevenger, Sivananda K. Kanakasabapathy, Christopher J. Penny, Nicole Saulnier | 2018-08-21 |
| 9941142 | Tunable TiOxNy hardmask for multilayer patterning | Abraham Arceo de la Pena, Ekmini Anuja De Silva, Sivananda K. Kanakasabapathy | 2018-04-10 |
| 9934970 | Self aligned pattern formation post spacer etchback in tight pitch configurations | Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Christopher J. Penny +2 more | 2018-04-03 |
| 9911647 | Self aligned conductive lines | Sean D. Burns, Lawrence A. Clevenger, Anuja E. DeSilva, Sivananda K. Kanakasabapathy, Yann Mignot +3 more | 2018-03-06 |
| 9799534 | Application of titanium-oxide as a patterning hardmask | Abraham Arceo de la Pena, Ekmini Anuja De Silva, Sivananda K. Kanakasabapathy, Indira Seshadri | 2017-10-24 |
| 9786554 | Self aligned conductive lines | Sean D. Burns, Lawrence A. Clevenger, Anuja E. DeSilva, Sivananda K. Kanakasabapathy, Yann Mignot +3 more | 2017-10-10 |
| 9779944 | Method and structure for cut material selection | Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Yann Mignot +3 more | 2017-10-03 |
| 9257351 | Metrology marks for bidirectional grating superposition patterning processes | Christopher P. Ausschnitt, Scott Halle | 2016-02-09 |
| 9059102 | Metrology marks for unidirectional grating superposition patterning processes | Christopher P. Ausschnitt, Scott D. Halle | 2015-06-16 |