Issued Patents All Time
Showing 26–50 of 70 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10748823 | Embedded etch rate reference layer for enhanced etch time precision | Yann Mignot, Alan C. Thomas, Daniel P. Sanders, Dario L. Goldfarb, Nelson Felix +1 more | 2020-08-18 |
| 10714683 | Multilayer hardmask for high performance MRAM devices | Michael Rizzolo, Daniel C. Edelstein, Theodorus E. Standaert, Kisup Chung, Isabel Cristina Chu | 2020-07-14 |
| 10707413 | Formation of embedded magnetic random-access memory devices | Ashim Dutta, Chih-Chao Yang, Michael Rizzolo, Jon Slaughter | 2020-07-07 |
| 10685879 | Lithographic alignment of a conductive line to a via | Ashim Dutta, Dominik Metzler, Takeshi Nogami | 2020-06-16 |
| 10680169 | Multilayer hardmask for high performance MRAM devices | Michael Rizzolo, Daniel C. Edelstein, Theodorus E. Standaert, Kisup Chung, Isabel Cristina Chu | 2020-06-09 |
| 10580652 | Alternating hardmasks for tight-pitch line formation | Anuja E. DeSilva, Nelson Felix, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg | 2020-03-03 |
| 10559467 | Selective gas etching for self-aligned pattern transfer | Sean D. Burns, Yann Mignot, Yongan Xu | 2020-02-11 |
| 10304692 | Method of forming field effect transistor (FET) circuits, and forming integrated circuit (IC) chips with the FET circuits | Robert L. Bruce, Sebastian U. Engelmann, Nathan P. Marchack, Hiroyuki Miyazoe, Jeffrey C. Shearer +1 more | 2019-05-28 |
| 10242872 | Rework of patterned dielectric and metal hardmask films | Prasad Bhosale, Donald F. Canaperi, Raghuveer R. Patlolla, Cornelius Brown Peethala, Hosadurga Shobha +1 more | 2019-03-26 |
| 10103022 | Alternating hardmasks for tight-pitch line formation | Anuja E. DeSilva, Nelson Felix, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg | 2018-10-16 |
| 10032632 | Selective gas etching for self-aligned pattern transfer | Sean D. Burns, Yann Mignot, Yongan Xu | 2018-07-24 |
| 9373580 | Dual hard mask lithography process | Sean D. Burns, Steven J. Holmes, David V. Horak, Muthumanickam Sankarapandian, Yunpeng Yin | 2016-06-21 |
| 8916337 | Dual hard mask lithography process | Sean D. Burns, Steven J. Holmes, David V. Horak, Muthumanickam Sankarapandian, Yunpeng Yin | 2014-12-23 |
| 8883649 | Sidewall image transfer process | Yunpeng Yin, Matthew E. Colburn, Sean D. Burns | 2014-11-11 |
| 8735283 | Method for forming small dimension openings in the organic masking layer of tri-layer lithography | Jennifer D. Schuler, Yunpeng Yin | 2014-05-27 |
| 8586482 | Film stack including metal hardmask layer for sidewall image transfer fin field effect transistor formation | Sivananda K. Kanakasabapathy, Stefan Schmitz, Yunpeng Yin | 2013-11-19 |
| 8580692 | Film stack including metal hardmask layer for sidewall image transfer fin field effect transistor formation | Sivananda K. Kanakasabapathy, Stefan Schmitz, Yunpeng Yin | 2013-11-12 |
| 8536031 | Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme | Kuang-Jung Chen, Matthew E. Colburn, Dario L. Goldfarb, Stefan Harrer, Steven J. Holmes +1 more | 2013-09-17 |
| 8536630 | Transistor devices and methods of making | Xuefeng Hua, Rangarajan Jagannathan, Stefan Schmitz | 2013-09-17 |
| 8518824 | Self aligning via patterning | Sean D. Burns, Sivananda K. Kanakasabapathy, Yunpeng Yin | 2013-08-27 |
| 8481423 | Methods to mitigate plasma damage in organosilicate dielectrics | Griselda Bonilla, William J. Cote, Geraud Jean-Michel Dubois, Daniel C. Edelstein, Alfred Grill +8 more | 2013-07-09 |
| 8470711 | Tone inversion with partial underlayer etch for semiconductor device formation | Sean D. Burns, Matthew E. Colburn, Steven J. Holmes, Yunpeng Yin | 2013-06-25 |
| 8470706 | Methods to mitigate plasma damage in organosilicate dielectrics | Griselda Bonilla, William J. Cote, Geraud Jean-Michel Dubois, Daniel C. Edelstein, Alfred Grill +8 more | 2013-06-25 |
| 8464397 | Self-affixing handle | Stephanie Arnold | 2013-06-18 |
| 8448103 | Manufacturing features of different depth by placement of vias | Catherine B. Labelle | 2013-05-21 |