CL

Christian Lavoie

IBM: 160 patents #258 of 70,183Top 1%
Globalfoundries: 19 patents #170 of 4,424Top 4%
Infineon Technologies Ag: 1 patents #4,439 of 7,486Top 60%
UL Ultratech: 1 patents #58 of 110Top 55%
Samsung: 1 patents #49,284 of 75,807Top 70%
📍 Pleasantville, NY: #3 of 229 inventorsTop 2%
🗺 New York: #192 of 115,490 inventorsTop 1%
Overall (All Time): #4,569 of 4,157,543Top 1%
174
Patents All Time

Issued Patents All Time

Showing 151–174 of 174 patents

Patent #TitleCo-InventorsDate
6987050 Self-aligned silicide (salicide) process for low resistivity contacts to thin film silicon-on-insulator and bulk MOSFETS and for shallow junctions Cyril Cabral, Jr., Kevin K. Chan, Guy M. Cohen, Ronnen Andrew Roy, Paul M. Solomon 2006-01-17
6972250 Method and structure for ultra-low contact resistance CMOS formed by vertically self-aligned CoSi2 on raised source drain Si/SiGe device Cyril Cabral, Jr., Roy A. Carruthers, Kevin K. Chan, Jack O. Chu, Guy M. Cohen +2 more 2005-12-06
6927117 Method for integration of silicide contacts and silicide gate metals Cyril Cabral, Jr., Jakub Kedzierski, Victor Ku, Vijay Narayanan, An Steegen 2005-08-09
6916729 Salicide formation method Sunfei Fang, Keith Kwong Hon Wong, Paul D. Agnello, Lawrence A. Clevenger, Chester T. Dziobkowski +4 more 2005-07-12
6905560 Retarding agglomeration of Ni monosilicide using Ni alloys Cyril Cabral, Jr., Roy A. Carruthers, Christophe Detavernier, James M. E. Harper 2005-06-14
6878624 Pre-anneal of CoSi, to prevent formation of amorphous layer between Ti-O-N and CoSi John Bruley, Cyril Cabral, Jr., Tina Wagner, Yun-Yu Wang, Horati S. Wildman +1 more 2005-04-12
6809030 Method and structure for controlling the interface roughness of cobalt disilicide Paul D. Agnello, Cyril Cabral, Jr., Roy A. Carruthers, James M. E. Harper, Kirk D. Peterson +4 more 2004-10-26
6777298 Elevated source drain disposable spacer CMOS Ronnen Andrew Roy, Cyril Cabral, Jr., Kam-Leung Lee 2004-08-17
6753606 Method and structure for reduction of contact resistance of metal silicides using a metal-germanium alloy Cyril Cabral, Jr., Roy A. Carruthers, James M. E. Harper, Ronnen Andrew Roy, Yun-Yu Wang 2004-06-22
6716708 Self-aligned silicide process utilizing ion implants for reduced silicon consumption and control of the silicide formation temperature and structure formed thereby Cyril Cabral, Jr., Kevin K. Chan, Guy M. Cohen, Kathryn Guarini, Ronnen Andrew Roy +1 more 2004-04-06
6690072 Method and structure for ultra-low contact resistance CMOS formed by vertically self-aligned CoSi2 on raised source drain Si/SiGe device Cyril Cabral, Jr., Roy A. Carruthers, Kevin K. Chan, Jack O. Chu, Guy M. Cohen +2 more 2004-02-10
6645861 Self-aligned silicide process for silicon sidewall source and drain contacts Cyril Cabral, Jr., Kevin K. Chan, Guy M. Cohen, Kathryn Guarini, Paul M. Solomon +1 more 2003-11-11
6555880 Self-aligned silicide process utilizing ion implants for reduced silicon consumption and control of the silicide formation temperature and structure formed thereby Cyril Cabral, Jr., Kevin K. Chan, Guy M. Cohen, Kathryn Guarini, Ronnen Andrew Roy +1 more 2003-04-29
6503833 Self-aligned silicide (salicide) process for strained silicon MOSFET ON SiGe and structure formed thereby Atul Ajmera, Cyril Cabral, Jr., Roy A. Carruthers, Kevin K. Chan, Guy M. Cohen +3 more 2003-01-07
6448131 Method for increasing the capacitance of a trench capacitor Cyril Cabral, Jr., Kevin K. Chan, Guy M. Cohen, Ramachandra Divakaruni, Fenton R. McFeely 2002-09-10
6444578 Self-aligned silicide process for reduction of Si consumption in shallow junction and thin SOI electronic devices Cyril Cabral, Jr., Roy A. Carruthers, Kevin K. Chan, Guy M. Cohen, Kathryn Guarini +2 more 2002-09-03
6440851 Method and structure for controlling the interface roughness of cobalt disilicide Paul D. Agnello, Cyril Cabral, Jr., Roy A. Carruthers, James M. E. Harper, Kirk D. Peterson +4 more 2002-08-27
6436823 Method for forming a TiN layer on top of a metal silicide layer in a semiconductor structure and structure formed Cyril Cabral, Jr., Chung-Ping Eng, Lynne M. Gignac, Patricia A. O'Neil, Kirk D. Peterson +3 more 2002-08-20
6417567 Flat interface for a metal-silicon contract barrier film Anthony G. Domenicucci, Lynne M. Gignac, Yun-Yu Wang, Horatio S. Wildman, Kwong Hon Wong +2 more 2002-07-09
6413859 Method and structure for retarding high temperature agglomeration of silicides using alloys Cyril Cabral, Jr., Roy A. Carruthers, James M. E. Harper, Paul Kozlowski, Joseph S. Newbury +1 more 2002-07-02
6331486 Method and structure for reduction of contact resistance of metal silicides using a metal-germanium alloy Cyril Cabral, Jr., Roy A. Carruthers, James M. E. Harper, Ronnen Andrew Roy, Yun-Yu Wang 2001-12-18
6323130 Method for self-aligned formation of silicide contacts using metal silicon alloys for limited silicon consumption and for reduction of bridging Stephen Bruce Brodsky, Cyril Cabral, Jr., Roy A. Carruthers, James M. E. Harper, Patricia A. O'Neil +1 more 2001-11-27
5568978 Optical apparatus and method for measuring temperature of a substrate material with a temperature dependent band gap Shane R. Johnson, Mark K. Nissen, J. Thomas Tiedje 1996-10-29
5388909 Optical apparatus and method for measuring temperature of a substrate material with a temperature dependent band gap Shane R. Johnson, Mark K. Nissen, J. Thomas Tiedje 1995-02-14