Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8927431 | High-rate chemical vapor etch of silicon substrates | Stephen W. Bedell, Gen P. Lauer, Isaac Lauer | 2015-01-06 |
| 8865556 | Using fast anneal to form uniform Ni(Pt)Si(Ge) contacts on SiGe layer | Kenneth P. Rodbell, Zhen Zhang, Yu Zhu | 2014-10-21 |
| 8421191 | Monolayer dopant embedded stressor for advanced CMOS | Kevin K. Chan, Abhishek Dube, Judson R. Holt, Jinghong Li, Viorel Ontalus +2 more | 2013-04-16 |
| 8383483 | High performance CMOS circuits, and methods for fabricating same | John C. Arnold, Glenn A. Biery, Alessandro C. Callegari, Tze-Chiang Chen, Michael P. Chudzik +7 more | 2013-02-26 |
| 8236660 | Monolayer dopant embedded stressor for advanced CMOS | Kevin K. Chan, Abhishek Dube, Judson R. Holt, Jinghong Li, Viorel Ontalus +2 more | 2012-08-07 |
| 6503833 | Self-aligned silicide (salicide) process for strained silicon MOSFET ON SiGe and structure formed thereby | Atul Ajmera, Cyril Cabral, Jr., Roy A. Carruthers, Kevin K. Chan, Guy M. Cohen +3 more | 2003-01-07 |
| 6444592 | Interfacial oxidation process for high-k gate dielectric process integration | Arne Ballantine, Douglas A. Buchanan, Eduard A. Cartier, Kevin K. Chan, Matthew W. Copel +6 more | 2002-09-03 |
| 6413859 | Method and structure for retarding high temperature agglomeration of silicides using alloys | Cyril Cabral, Jr., Roy A. Carruthers, James M. E. Harper, Paul Kozlowski, Christian Lavoie +1 more | 2002-07-02 |