Issued Patents All Time
Showing 101–125 of 174 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8609533 | Methods for fabricating integrated circuits having substrate contacts and integrated circuits having substrate contacts | Thilo Scheiper, Stefan Flachowsky | 2013-12-17 |
| 8598007 | Methods of performing highly tilted halo implantation processes on semiconductor devices | Stefan Flachowsky, Thilo Scheiper | 2013-12-03 |
| 8574991 | Asymmetric transistor devices formed by asymmetric spacers and tilted implantation | Uwe Griebenow, Maciej Wiatr | 2013-11-05 |
| 8574981 | Method of increasing the germanium concentration in a silicon-germanium layer and semiconductor device comprising same | Stefan Flachowsky, Thilo Scheiper, Peter Javorka | 2013-11-05 |
| 8563374 | Strained semiconductor devices having asymmetrical heterojunction structures and methods for the fabrication thereof | Stefan Flachowsky | 2013-10-22 |
| 8564089 | Electronic fuse structure formed using a metal gate electrode material stack configuration | Andreas Kurz, Christoph Schwan | 2013-10-22 |
| 8536036 | Predoped semiconductor material for a high-K metal gate electrode structure of P- and N-channel transistors | Sven Beyer, Uwe Griebenow, Thilo Scheiper | 2013-09-17 |
| 8536034 | Methods of forming stressed silicon-carbon areas in an NMOS transistor | Stefan Flachowsky, Ralf Illgen, Thilo Scheiper | 2013-09-17 |
| 8524563 | Semiconductor device with strain-inducing regions and method thereof | Stefan Flachowsky, Thilo Scheiper | 2013-09-03 |
| 8524566 | Methods for the fabrication of integrated circuits including back-etching of raised conductive structures | Stefan Flachowsky, Ricardo P. Mikalo | 2013-09-03 |
| 8508008 | Optical signal transfer in a semiconductor device by using monolithic opto-electronic components | Uwe Griebenow, Sven Beyer, Thilo Sheiper | 2013-08-13 |
| 8507348 | Field effect transistors for a flash memory comprising a self-aligned charge storage region | Thilo Scheiper, Sven Beyer, Uwe Griebenow | 2013-08-13 |
| 8501601 | Drive current increase in field effect transistors by asymmetric concentration profile of alloy species of a channel semiconductor alloy | Stefan Flachowsky, Thilo Scheiper, Steven Langdon | 2013-08-06 |
| 8471342 | Integrated circuits formed on strained substrates and including relaxed buffer layers and methods for the manufacture thereof | Stefan Flachowsky | 2013-06-25 |
| 8455314 | Transistors comprising high-K metal gate electrode structures and embedded strain-inducing semiconductor alloys formed in a late stage | Uwe Griebenow, Thilo Scheiper, Sven Beyer | 2013-06-04 |
| 8450124 | Adjusting configuration of a multiple gate transistor by controlling individual fins | Robert Neil Mulfinger, Vassilios Papageorgiou | 2013-05-28 |
| 8450163 | Semiconductor device comprising metal gates and semiconductor resistors formed on the basis of a replacement gate approach | Sven Beyer, Klaus Hempel, Roland Stejskal, Andy Wei, Thilo Scheiper +2 more | 2013-05-28 |
| 8440516 | Method of forming a field effect transistor | Andy Wei, Thorsten Kammler, Manfred Horstmann | 2013-05-14 |
| 8440534 | Threshold adjustment for MOS devices by adapting a spacer width prior to implantation | Uwe Griebenow, Kai Frohberg, Heike Berthold, Katrin Reiche, Frank Feustel +1 more | 2013-05-14 |
| 8440530 | Methods of forming highly scaled semiconductor devices using a disposable spacer technique | Stefan Flachowsky, Shiang Yang Ong | 2013-05-14 |
| 8426262 | Stress adjustment in stressed dielectric materials of semiconductor devices by stress relaxation based on radiation | Uwe Griebenow, Roman Boschke | 2013-04-23 |
| 8426266 | Stress memorization with reduced fringing capacitance based on silicon nitride in MOS semiconductor devices | Andreas Kurz, Uwe Griebenow, Thilo Scheiper | 2013-04-23 |
| 8415221 | Semiconductor devices having encapsulated stressor regions and related fabrication methods | Stefan Flachowsky | 2013-04-09 |
| 8409942 | Replacement gate approach based on a reverse offset spacer applied prior to work function metal deposition | Thilo Scheiper, Sven Beyer, Uwe Griebenow | 2013-04-02 |
| 8404550 | Performance enhancement in PFET transistors comprising high-k metal gate stack by increasing dopant confinement | Thilo Scheiper, Sven Beyer, Andy Wei | 2013-03-26 |