Issued Patents All Time
Showing 26–50 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9991134 | Processing systems and methods for halide scavenging | Anchuan Wang, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2018-06-05 |
| 9978564 | Chemical control features in wafer process equipment | Qiwei Liang, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more | 2018-05-22 |
| 9892888 | Particle generation suppresor by DC bias modulation | Jonghoon Baek, Soonam Park, Dmitry Lubomirsky | 2018-02-13 |
| 9865474 | Etching method using plasma, and method of fabricating semiconductor device including the etching method | Gon-jun Kim, Vladimir Volynets, Sang Jin An, Hee-jeon Yang, Sangheon Lee +2 more | 2018-01-09 |
| 9768051 | Wafer clamping apparatus | Dali Liu, Sung Ho JANG, Yong-Ho Lim | 2017-09-19 |
| 9741545 | RPS assisted RF plasma source for semiconductor processing | Saurabh Garg, Jang-Gyoo Yang | 2017-08-22 |
| 9704723 | Processing systems and methods for halide scavenging | Anchuan Wang, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2017-07-11 |
| 9659792 | Processing systems and methods for halide scavenging | Anchuan Wang, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2017-05-23 |
| 9593421 | Particle generation suppressor by DC bias modulation | Jonghoon Baek, Soonam Park, Dmitry Lubomirsky | 2017-03-14 |
| 9524889 | Processing systems and apparatus adapted to process substrates in electronic device manufacturing | Steve Hongkham, Paul B. Reuter, Eric A. Englhardt, Ganesh Balasubramanian, JuanCarlos Rocha-Alvarez | 2016-12-20 |
| 9520301 | Etching method using plasma, and method of fabricating semiconductor device including the etching method | Go-jun Kim, Vladimir Volynets, Sang Jin An, Hee-jeon Yang, Sang Heon Lee +2 more | 2016-12-13 |
| 9502218 | RPS assisted RF plasma source for semiconductor processing | Saurabh Garg, Jang-Gyoo Yang | 2016-11-22 |
| 9449850 | Processing systems and methods for halide scavenging | Anchuan Wang, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2016-09-20 |
| 9384997 | Dry-etch selectivity | He Ren, Jang-Gyoo Yang, Jonghoon Baek, Anchuan Wang, Soonam Park +2 more | 2016-07-05 |
| 9373517 | Semiconductor processing with DC assisted RF power for improved control | Jang-Gyoo Yang, Soonam Park, Jonghoon Baek, Saurabh Garg, Shankar Venkataraman | 2016-06-21 |
| 9362130 | Enhanced etching processes using remote plasma sources | Nitin K. Ingle, Dmitry Lubomirsky, Shankar Venkataraman | 2016-06-07 |
| 9267739 | Pedestal with multi-zone temperature control and multiple purge capabilities | Jang-Gyoo Yang, Alexander Tam, Elisha Tam | 2016-02-23 |
| 9202736 | Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing | Kadthala Ramaya Narendrnath, Dmitry Lubomirsky, Sudhir Gondhalekar, Muhammad M. Rasheed, Tony Kaushal | 2015-12-01 |
| 9184055 | Processing systems and methods for halide scavenging | Anchuan Wang, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2015-11-10 |
| 9153442 | Processing systems and methods for halide scavenging | Anchuan Wang, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2015-10-06 |
| 9144147 | Semiconductor processing system and methods using capacitively coupled plasma | Jang-Gyoo Yang, Matthew L. Miller, Kien N. Chuc, Qiwei Liang, Shankar Venkataraman +1 more | 2015-09-22 |
| 9132436 | Chemical control features in wafer process equipment | Qiwei Liang, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more | 2015-09-15 |
| 9093371 | Processing systems and methods for halide scavenging | Anchuan Wang, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2015-07-28 |
| 9023732 | Processing systems and methods for halide scavenging | Anchuan Wang, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2015-05-05 |
| 8969212 | Dry-etch selectivity | He Ren, Jang-Gyoo Yang, Jonghoon Baek, Anchuan Wang, Soonam Park +2 more | 2015-03-03 |