Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12347734 | Examination of a hole formed in a semiconductor specimen | Rafael BISTRITZER, Vadim Vereschagin, Grigory Klebanov, Ilan BEN-HARUSH, Omer Kerem +2 more | 2025-07-01 |
| 11756188 | Determining a critical dimension variation of a pattern | Vadim Vereschagin, Ishai Schwarzband, Boaz Cohen, Evgeny Bal, Ariel Shkalim | 2023-09-12 |
| 11686571 | Local shape deviation in a semiconductor specimen | Ilan BEN-HARUSH, Rafael BISTRITZER, Vadim Vereschagin, Elad Sommer, Grigory Klebanov +5 more | 2023-06-27 |
| 11651509 | Method, system and computer program product for 3D-NAND CDSEM metrology | Roi Meir, Sahar LEVIN, Ishai Schwarzband, Grigory Klebanov, Shimon Levi +6 more | 2023-05-16 |
| 11476081 | Evaluating an intermediate product related to a three-dimensional NAND memory unit | Vadim Vereschagin, Assaf Shamir, Elad Sommer, Sharon Duvdevani-Bar, Meng Li Cecilia Lim | 2022-10-18 |
| 11455715 | Epitaxy metrology in fin field effect transistors | Jitendra Pradipkumar Chaudhary, Ran Alkoken, Sahar LEVIN, Chih-Chieh Chang, Einat Frishman | 2022-09-27 |
| 11443420 | Generating a metrology recipe usable for examination of a semiconductor specimen | Grigory Klebanov, Einat Frishman, Tal Orenstein, Meir Vengrover, Noa Marom +3 more | 2022-09-13 |
| 11301983 | Measuring height difference in patterns on semiconductor wafers | Ishai Schwarzband, Yan Avniel, Sergey Khristo, Mor Baram, Shimon Levi +1 more | 2022-04-12 |
| 11276160 | Determining a critical dimension variation of a pattern | Vadim Vereschagin, Ishai Schwarzband, Boaz Cohen, Ariel Shkalim, Evgeny Bal | 2022-03-15 |
| 11056404 | Evaluating a hole formed in an intermediate product | Grigory Klebanov, Dhananjay Singh Rathore, Einat Frishman, Sharon Duvdevani-Bar, Assaf Shamir +5 more | 2021-07-06 |
| 10748272 | Measuring height difference in patterns on semiconductor wafers | Ishai Schwarzband, Yan Avniel, Sergey Khristo, Mor Baram, Shimon Levi +1 more | 2020-08-18 |
| 10731979 | Method for monitoring nanometric structures | Shimon Levi, Ishai Schwarzband | 2020-08-04 |
| 10354376 | Technique for measuring overlay between layers of a multilayer structure | Yakov Weinberg, Ishai Schwarzband, Itay Zauer, Ran Goldman, Olga Novak +3 more | 2019-07-16 |
| 9916652 | Technique for measuring overlay between layers of a multilayer structure | Yakov Weinberg, Ishai Schwarzband, Itay Zauer, Ran Goldman, Olga Novak +3 more | 2018-03-13 |
| 9824852 | CD-SEM technique for wafers fabrication control | Yakov Weinberg, Yan Ivanchenko, Ishai Schwarzband, Dan Lange, Arbel Englander +3 more | 2017-11-21 |
| 9530199 | Technique for measuring overlay between layers of a multilayer structure | Yakov Weinberg, Ishai Schwarzband, Itay Zauer, Ran Goldman, Olga Novak +3 more | 2016-12-27 |
| 9165376 | System, method and computer readable medium for detecting edges of a pattern | Ishai Schwartzband, Shimon Levi | 2015-10-20 |
| 7973919 | High resolution wafer inspection system | Dan Grossman, Moshe Langer, Silviu Reinhorn, Ron Naftali, Haim Feldman | 2011-07-05 |
| 7714999 | High resolution wafer inspection system | Dan Grossman, Moshe Langer, Silviu Reinhorn, Ron Naftali, Haim Feldman | 2010-05-11 |