JW

John M. White

Applied Materials: 221 patents #5 of 7,310Top 1%
AT Applied Komatsu Technology: 18 patents #2 of 62Top 4%
RA Rally Accessories: 4 patents #4 of 8Top 50%
UN Unknown: 2 patents #12,644 of 83,584Top 20%
RM Rally Manufacturing: 1 patents #9 of 18Top 50%
📍 Hayward, CA: #2 of 1,120 inventorsTop 1%
🗺 California: #340 of 386,348 inventorsTop 1%
Overall (All Time): #1,940 of 4,157,543Top 1%
252
Patents All Time

Issued Patents All Time

Showing 176–200 of 252 patents

Patent #TitleCo-InventorsDate
6624077 Integrated circuit waveguide 2003-09-23
6592439 Platen for retaining polishing material Shijian Li, Manoocher Birang, Ramin Emami, Andrew J. Nagengast, Douglas Orcutt Brown +2 more 2003-07-15
6577923 Apparatus and method for robotic alignment of substrates Shinichi Kurita 2003-06-10
6561884 Web lift system for chemical mechanical planarization Phillip R. Sommer, Sasson Somekh 2003-05-13
6541384 Method of initiating cooper CMP process Lizhong Sun, Stan Tsai, Shijian Li 2003-04-01
6516816 Spin-rinse-dryer Anwar Husain, Brian J. Brown, David G. Andeen, Svetlana Sherman, Michael Sugarman +2 more 2003-02-11
6517303 Substrate transfer shuttle Norman L. Turner, Robin L. Tiner, Ernst Keller, Shinichi Kurita, Wendell T. Blonigan +1 more 2003-02-11
6517048 Isolation valves Gary C. Ettinger 2003-02-11
6488565 Apparatus for chemical mechanical planarization having nested load cups Phillip R. Sommer 2002-12-03
6485359 Platen arrangement for a chemical-mechanical planarization apparatus Shijian Li, Fred C. Redeker, Manoocher Birang 2002-11-26
6477980 Flexibly suspended gas distribution manifold for plasma chamber Ernst Keller, Wendell T. Blonigan 2002-11-12
6475070 Chemical mechanical polishing with a moving polishing sheet 2002-11-05
6471459 Substrate transfer shuttle having a magnetic drive Wendell T. Blonigan 2002-10-29
6435941 Apparatus and method for chemical mechanical planarization 2002-08-20
6435868 Multi-function chamber for a substrate processing system Wendell T. Blonigan, Michael W. Richter 2002-08-20
6413873 System for chemical mechanical planarization Shijian Li, Lawrence Rosenberg, Martin Scales, Ramin Emami, James V. Tietz +1 more 2002-07-02
6379231 Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet Manoocher Birang, Lawrence Rosenberg, Sasson Somekh 2002-04-30
6371712 Support frame for substrates Larry Chang, Emanuel Beer 2002-04-16
6355108 Film deposition using a finger type shadow frame Tae Kyung Won, Quanyuan Shang, Robert Robertson, Soo Young Choi, Kam S. Law +1 more 2002-03-12
6322427 Conditioning fixed abrasive articles Shijian Li, Sidney P. Huey, Ramin Emami, Fritz Redeker 2001-11-27
6308932 Isolation valves Gary C. Ettinger 2001-10-30
6286230 Method of controlling gas flow in a substrate processing system Wendell T. Blonigan, Michael W. Richter 2001-09-11
6273794 Apparatus and method for grinding a semiconductor wafer surface James V. Tietz 2001-08-14
6261157 Selective damascene chemical mechanical polishing Rajeev Bajaj, Fritz Redeker, Shijian Li, Yutao Ma 2001-07-17
6244935 Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet Manoocher Birang, Lawrence Rosenberg, Sasson Somekh 2001-06-12