Issued Patents All Time
Showing 201–225 of 252 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6241585 | Apparatus and method for chemical mechanical polishing | — | 2001-06-05 |
| 6241583 | Chemical mechanical polishing with a plurality of polishing sheets | — | 2001-06-05 |
| 6235634 | Modular substrate processing system | Robert B. Conner, Jr., Kam S. Law, Norman L. Turner, William T. Lee, Shinichi Kurita | 2001-05-22 |
| 6224681 | Vaporizing reactant liquids for chemical vapor deposition film processing | Visweswaren Sivaramakrishnan | 2001-05-01 |
| 6215897 | Automated substrate processing system | Emanuel Beer | 2001-04-10 |
| 6213704 | Method and apparatus for substrate transfer and processing | Wendell T. Blonigan, Robin L. Tiner, Shinichi Kurita | 2001-04-10 |
| 6206176 | Substrate transfer shuttle having a magnetic drive | Wendell T. Blonigan | 2001-03-27 |
| 6193507 | Multi-function chamber for a substrate processing system | Wendell T. Blonigan, Michael W. Richter | 2001-02-27 |
| 6176668 | In-situ substrate transfer shuttle | Shinichi Kurita | 2001-01-23 |
| 6167834 | Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | David N. Wang, Kam S. Law, Cissy Leung, Salvador P. Umotoy, Kenneth S. Collins +3 more | 2001-01-02 |
| 6149365 | Support frame for substrates | Larry Chang, Emanuel Beer | 2000-11-21 |
| 6132295 | Apparatus and method for grinding a semiconductor wafer surface | James V. Tietz | 2000-10-17 |
| 6086362 | Multi-function chamber for a substrate processing system | Wendell T. Blonigan, Michael W. Richter | 2000-07-11 |
| 6079693 | Isolation valves | Gary C. Ettinger | 2000-06-27 |
| 6040022 | PECVD of compounds of silicon from silane and nitrogen | Mei Chang, David N. Wang, Dan Maydan | 2000-03-21 |
| RE36623 | Process for PECVD of silicon oxide using TEOS decomposition | David N. Wang, Kam S. Law, Cissy Leung, Salvador P. Umotoy, Kenneth S. Collins +3 more | 2000-03-21 |
| 6016611 | Gas flow control in a substrate processing system | Wendell T. Blonigan, Michael W. Richter | 2000-01-25 |
| 5959409 | Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method protecting such heated metal surfaces | Charles Dornfest, Craig Bercaw, Hiroyuki Steven Tomosawa, Mark Fodor | 1999-09-28 |
| 5871811 | Method for protecting against deposition on a selected region of a substrate | David N. Wang, Kam S. Law, Cissy Leung, Salvador P. Umotoy, Kenneth S. Collins +3 more | 1999-02-16 |
| 5853607 | CVD processing chamber | Jun Zhao, Tom K. Cho, Charles Dornfest, Stefan Wolff, Kevin Fairbairn +2 more | 1998-12-29 |
| 5844205 | Heated substrate support structure | Larry Chang | 1998-12-01 |
| 5815047 | Fast transition RF impedance matching network for plasma reactor ignition | Carl A. Sorensen, Wendell T. Blonigan | 1998-09-29 |
| 5773100 | PECVD of silicon nitride films | Mei Chang, David N. Wang, Dan Maydan | 1998-06-30 |
| 5755886 | Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing | David N. Wang, Kam S. Law, Cissy Leung, Salvador P. Umotoy, Kenneth S. Collins +3 more | 1998-05-26 |
| 5680013 | Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method of protecting such heated metal surfaces | Charles Dornfest, Craig Bercaw, Hiroyuki Steven Tomosawa, Mark Fodor | 1997-10-21 |