Issued Patents All Time
Showing 151–175 of 252 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7055808 | Vaporizing reactant liquids for chemical vapor deposition film processing | Visweswaren Sivaramakrishnan, Koichi Ishikawa, Hideaki Miyamoto, Takeshi Kawano | 2006-06-06 |
| 7041599 | High through-put Cu CMP with significantly reduced erosion and dishing | Shijian Li, Fred C. Redeker, Ramin Emami | 2006-05-09 |
| 7029529 | Method and apparatus for metallization of large area substrates | Kam S. Law, Robert Z. Bachrach, Quanyuan Shang | 2006-04-18 |
| 7017269 | Suspended gas distribution plate | Ernst Keller, Wendell T. Blonigan | 2006-03-28 |
| 7014538 | Article for polishing semiconductor substrates | Lawrence Rosenberg, Shijian Li, Manoocher Birang, Marty Scales, Ramin Emami +1 more | 2006-03-21 |
| 7014545 | Vibration damping in a chemical mechanical polishing system | Hung Chih Chen, Shijian Li, Fred C. Redeker, Ramin Emami | 2006-03-21 |
| 7008303 | Web lift system for chemical mechanical planarization | Phillip R. Sommer, Sasson Somekh | 2006-03-07 |
| 6921494 | Backside etching in a scrubber | Brian J. Brown, Madhavi R. Chandrachood, Radha Nayak, Fred C. Redeker, Michael Sugarman | 2005-07-26 |
| 6887776 | Methods to form metal lines using selective electrochemical deposition | Quanyuan Shang, Robert Z. Bachrach, Kam S. Law | 2005-05-03 |
| 6847730 | Automated substrate processing system | Emanuel Beer | 2005-01-25 |
| 6837779 | Chemical mechanical polisher with grooved belt | Christopher Wayne Smith | 2005-01-04 |
| 6825134 | Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow | Kam S. Law, Quanyuan Shang, William Harshbarger, Dan Maydan, Soo Young Choi +2 more | 2004-11-30 |
| 6823589 | Flexibly suspended gas distribution manifold for plasma chamber | Ernst Keller, Wendell T. Blonigan | 2004-11-30 |
| 6820298 | Wafer scrubbing device having brush assembly and mounting assembly forming spherical joint | Ying Yu, Michael Sugarman | 2004-11-23 |
| 6783118 | Vaporizing reactant liquids for chemical vapor deposition film processing | Visweswaren Sivaramakrishnan | 2004-08-31 |
| 6746198 | Substrate transfer shuttle | Norman L. Turner, Robin L. Tiner, Ernst Keller, Shinichi Kurita, Wendell T. Blonigan +1 more | 2004-06-08 |
| 6729944 | Chemical mechanical polishing apparatus with rotating belt | Manoocher Birang, Lawrence Rosenberg, Sasson Somekh | 2004-05-04 |
| 6728989 | Labyrinth seal for bearing in brush mounting assembly for semiconductor wafer scrubber | Alexander Lerner, Shou-Sang Chang, Michael Sugarman | 2004-05-04 |
| 6725869 | Protective barrier for cleaning chamber | Alexander Lerner | 2004-04-27 |
| 6688375 | Vacuum processing system having improved substrate heating and cooling | Norman L. Turner, Alan D'Entremont | 2004-02-10 |
| 6679671 | Substrate transfer shuttle having a magnetic drive | Wendell T. Blonigan | 2004-01-20 |
| 6676497 | Vibration damping in a chemical mechanical polishing system | Hung Chih Chen, Shijian Li, Fred C. Redeker, Ramin Emami | 2004-01-13 |
| 6656842 | Barrier layer buffing after Cu CMP | Shijian Li, Fred C. Redeker, Ramin Emami, Sen-Hou Ko | 2003-12-02 |
| 6653242 | Solution to metal re-deposition during substrate planarization | Lizhong Sun, Stan Tsai, Shijian Li | 2003-11-25 |
| 6626744 | Planarization system with multiple polishing pads | Phillip R. Sommer, Stephen M Fisher, II | 2003-09-30 |