Issued Patents All Time
Showing 26–50 of 92 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11314173 | Topographic phase control for overlay measurement | Yuri Paskover, Amnon Manassen, Yoni Shalibo | 2022-04-26 |
| 11281111 | Off-axis illumination overlay measurement using two-diffracted orders imaging | Yoni Shalibo, Yuri Paskover, Amnon Manassen, Shlomo Eisenbach, Gilad Laredo +1 more | 2022-03-22 |
| 11256177 | Imaging overlay targets using Moiré elements and rotational symmetry arrangements | Yoel Feler, Mark Ghinovker, Diana Shaphirov, Evgeni Gurevich | 2022-02-22 |
| 11164307 | Misregistration metrology by using fringe Moiré and optical Moiré effects | Yoel Feler, Mark Ghinovker, Evgeni Gurevich, Alexander Svizher | 2021-11-02 |
| 11137692 | Metrology targets and methods with oblique periodic structures | Yoel Feler, Mark Ghinovker, Alexander Svizher, Inna Tarshish-Shapir | 2021-10-05 |
| 11112704 | Mitigation of inaccuracies related to grating asymmetries in scatterometry measurements | Ido Adam, Amnon Manassen, Yuval Lubashevsky | 2021-09-07 |
| 11101153 | Parameter-stable misregistration measurement amelioration in semiconductor devices | Yuri Paskover, Sharon Aharon, Amnon Manassen | 2021-08-24 |
| 11073768 | Metrology target for scanning metrology | Andrew V. Hill, Amnon Manassen, Gilad Laredo, Yoel Feler, Mark Ghinovker | 2021-07-27 |
| 11060845 | Polarization measurements of metrology targets and corresponding target designs | Eran Amit, Barry Loevsky, Andrew V. Hill, Amnon Manassen, Nuriel Amir +1 more | 2021-07-13 |
| 10901325 | Determining the impacts of stochastic behavior on overlay metrology data | Evgeni Gurevich, Michael Adel, Roel Gronheid, Yoel Feler, Dana Klein +1 more | 2021-01-26 |
| 10890436 | Overlay targets with orthogonal underlayer dummyfill | Nuriel Amir, Guy M. Cohen, Michael Adel | 2021-01-12 |
| 10866090 | Estimating amplitude and phase asymmetry in imaging technology for achieving high accuracy in overlay metrology | Tal Marciano, Nadav Gutman, Yuri Paskover, Guy M. Cohen | 2020-12-15 |
| 10824079 | Diffraction based overlay scatterometry | Yuval Lubashevsky, Yuri Paskover, Amnon Manassen | 2020-11-03 |
| 10824082 | Estimation of asymmetric aberrations | Yoel Feler | 2020-11-03 |
| 10761023 | Diffraction-based focus metrology | — | 2020-09-01 |
| 10754261 | Reticle optimization algorithms and optimal target design | Yoel Feler | 2020-08-25 |
| 10591406 | Symmetric target design in scatterometry overlay metrology | Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina +4 more | 2020-03-17 |
| 10579768 | Process compatibility improvement by fill factor modulation | Eitan Hajaj, Tal Itzkovich, Sharon Aharon, Michael Adel, Yuri Paskover +5 more | 2020-03-03 |
| 10565697 | Utilizing overlay misregistration error estimations in imaging overlay metrology | Tzahi Grunzweig, Nadav Gutman, David Gready, Mark Ghinovker, Claire E. Staniunas +2 more | 2020-02-18 |
| 10551749 | Metrology targets with supplementary structures in an intermediate layer | Amnon Manassen, Eran Amit, Nuriel Amir, Liran Yerushalmi, Amit Shaked | 2020-02-04 |
| 10527954 | Multi-layer overlay metrology target and complimentary overlay metrology measurement systems | Daniel Kandel, Guy M. Cohen | 2020-01-07 |
| 10520832 | Topographic phase control for overlay measurement | Yuri Paskover, Amnon Manassen, Yoni Shalibo | 2019-12-31 |
| 10458777 | Polarization measurements of metrology targets and corresponding target designs | Eran Amit, Barry Loevsky, Andrew V. Hill, Amnon Manassen, Nuriel Amir +1 more | 2019-10-29 |
| 10444161 | Systems and methods for metrology with layer-specific illumination spectra | Amnon Manassen, Daria Negri, Andrew V. Hill, Ohad Bachar, Yuri Paskover | 2019-10-15 |
| 10337991 | Control of amplitude and phase of diffraction orders using polarizing targets and polarized illumination | — | 2019-07-02 |