Issued Patents All Time
Showing 51–75 of 92 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10261014 | Near field metrology | Noam Sapiens, Joel Seligson, Daniel Kandel, Yoel Feler, Barak Bringoltz +2 more | 2019-04-16 |
| 10242290 | Method, system, and user interface for metrology target characterization | Inna Tarshish-Shapir, Yoel Feler, Anat Marchelli, Berta Dinu, Boris Efraty +4 more | 2019-03-26 |
| 10228320 | Achieving a small pattern placement error in metrology targets | Daniel Kandel | 2019-03-12 |
| 10197389 | Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields | Yuri Paskover, Yuval Lubashevsky, Amnon Manassen | 2019-02-05 |
| 10197922 | Focus metrology and targets which utilize transformations based on aerial images of the targets | Nadav Gutman, Yoel Feler, Oded Kaminsky | 2019-02-05 |
| 10139528 | Compound objectives for imaging and scatterometry overlay | Joel Seligson, Yuri Paskover, Amnon Manassen, Daniel Kandel, Andrew V. Hill | 2018-11-27 |
| 10101592 | Self-moiré target design principles for measuring unresolved device-like pitches | Yuri Paskover, Daniel Kandel | 2018-10-16 |
| 9934353 | Focus measurements using scatterometry metrology | Mohamed El Kodadi, Nuriel Amir, Roie Volkovich, Yoel Feler, Daniel Kandel +3 more | 2018-04-03 |
| 9927718 | Multi-layer overlay metrology target and complimentary overlay metrology measurement systems | Daniel Kandel, Guy M. Cohen | 2018-03-27 |
| 9869543 | Reducing algorithmic inaccuracy in scatterometry overlay metrology | Barak Bringoltz, Mark Ghinovker, Daniel Kandel, Zeev Bomzon | 2018-01-16 |
| 9864209 | Self-moire target design principles for measuring unresolved device-like pitches | Yuri Paskover, Daniel Kandel | 2018-01-09 |
| 9841689 | Approach for model calibration used for focus and dose measurement | Daniel Kandel, Yoel Feler, Nadav Gutman | 2017-12-12 |
| 9739702 | Symmetric target design in scatterometry overlay metrology | Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Irina Paykin +4 more | 2017-08-22 |
| 9678421 | Target element types for process parameter metrology | Feler Yoel, Daniel Kandel | 2017-06-13 |
| 9581430 | Phase characterization of targets | Amnon Manassen, Ohad Bachar, Daria Negri, Boris Golovanevsky, Barak Bringoltz +8 more | 2017-02-28 |
| 9454072 | Method and system for providing a target design displaying high sensitivity to scanner focus change | Yoel Feler, Daniel Kandel | 2016-09-27 |
| 9255895 | Angle-resolved antisymmetric scatterometry | Daniel Kandel, Noam Sapiens | 2016-02-09 |
| 9080991 | Illuminating a specimen for metrology or inspection | Yung-Ho Alex Chuang, Xuefeng Liu, John Fielden | 2015-07-14 |
| 9080971 | Metrology systems and methods | Daniel Kandel, Alexander Svizher, Joel Seligson, Andrew V. Hill, Ohad Bachar +6 more | 2015-07-14 |
| 9080990 | Illumination subsystems of a metrology system, metrology systems, and methods for illuminating a specimen for metrology measurements | Yung-Ho Alex Chuang, Xuefeng Liu | 2015-07-14 |
| 8913237 | Device-like scatterometry overlay targets | Daniel Kandel, Eran Amit | 2014-12-16 |
| 8896832 | Discrete polarization scatterometry | Andrew V. Hill, Amnon Manassen, Daniel Kandel, Joel Seligson, Alexander Svizher +3 more | 2014-11-25 |
| 8873054 | Metrology systems and methods | Daniel Kandel, Alexander Svizher, Joel Seligson, Andrew V. Hill, Ohad Bachar +6 more | 2014-10-28 |
| 8848186 | Angle-resolved antisymmetric scatterometry | Daniel Kandel, Noam Sapiens | 2014-09-30 |
| 8582114 | Overlay metrology by pupil phase analysis | Amnon Manassen, Daniel Kandel, Moshe Baruch, Noam Sapiens, Joel Seligson +4 more | 2013-11-12 |