Issued Patents All Time
Showing 76–100 of 296 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6846750 | High precision pattern forming method of manufacturing a semiconductor device | Tokuhisa Ohiwa, Shoji Seta, Nobuo Hayasaka, Akihiro Kojima, Junko Ohuchi +3 more | 2005-01-25 |
| 6809421 | Multichip semiconductor device, chip therefor and method of formation thereof | Nobuo Hayasaka, Keiichi Sasaki, Mie Matsuo | 2004-10-26 |
| 6800569 | Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus | Shinichi Ito, Tatsuhiko Ema, Kei Hayasaki, Rempei Nakata, Nobuhide Yamada | 2004-10-05 |
| 6788985 | ELECTRONIC COMMERCE METHOD FOR SEMICONDUCTOR PRODUCTS, ELECTRONIC COMMERCE THEREOF, PRODUCTION SYSTEM, PRODUCTION METHOD, PRODUCTION EQUIPMENT DESIGN SYSTEM, PRODUCTION EQUIPMENT DESIGN METHOD, AND PRODUCTION EQUIPMENT MANUFACTURING METHOD | Kunihiro Mitsutake | 2004-09-07 |
| 6784680 | Contact probe with guide unit and fabrication method thereof | Tsuyoshi Haga, Nobuo Hayasaka, Hideki Shibata, Noriaki Matsunaga | 2004-08-31 |
| 6746969 | Method of manufacturing semiconductor device | Miyoko Shimada, Hideshi Miyajima, Rempei Nakata, Hideto Matsuyama, Masahiko Hasunuma +1 more | 2004-06-08 |
| 6740590 | AQUEOUS DISPERSION, AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING USED FOR MANUFACTURE OF SEMICONDUCTOR DEVICES, METHOD FOR MANUFACTURE OF SEMICONDUCTOR DEVICES, AND METHOD FOR FORMATION OF EMBEDDED WRITING | Hiroyuki Yano, Gaku Minamihaba, Yukiteru Matsui, Akira Iio, Masayuki Hattori | 2004-05-25 |
| 6723572 | Method for monitoring the shape of the processed surfaces of semiconductor devices and equipment for manufacturing the semiconductor devices | Hiroyuki Yano | 2004-04-20 |
| 6722964 | Polishing apparatus and method | Norio Kimura, Mitsuhiko Shirakashi, You Ishii, Junji Kunisawa, Hiroyuki Yano | 2004-04-20 |
| 6709699 | Film-forming method, film-forming apparatus and liquid film drying apparatus | Tatsuhiko Ema, Shinichi Ito | 2004-03-23 |
| 6709966 | Semiconductor device, its manufacturing process, position matching mark, pattern forming method and pattern forming device | Yoshimi Hisatsune, Keiichi Sasaki, Hiroshi Ikegami, Mie Matsuo, Nobuo Hayasaka | 2004-03-23 |
| 6673704 | Semiconductor device and method of manufacturing the same | Junichi Wada, Atsuko Sakata, Tomio Katata, Takamasa Usui, Masahiko Hasunuma +3 more | 2004-01-06 |
| 6660091 | Apparatus for forming liquid film | Shinichi Ito | 2003-12-09 |
| 6646268 | Ion generation method and filament for ion generation apparatus | Atsushi Murakoshi, Kyoichi Suguro | 2003-11-11 |
| 6632335 | Plating apparatus | Junji Kunisawa, Mitsuko Odagaki, Natsuki Makino, Koji Mishima, Kenji Nakamura +7 more | 2003-10-14 |
| 6633045 | Assembly part with wiring and for manufacturing system, method of manufacturing such assembly part, and semiconductor manufacturing system constituted using assembly part | Kazuyoshi Sugihara, Atsushi Ando | 2003-10-14 |
| 6614033 | Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes | Kyoichi Suguro, Atsushi Murakoshi | 2003-09-02 |
| 6609950 | Method for polishing a substrate | Norio Kimura, Yu Ishii, Hirokuni Hiyama, Hiroyuki Yano | 2003-08-26 |
| 6608356 | Semiconductor device using damascene technique and manufacturing method therefor | Yusuke Kohyama, Nobuo Hayasaka | 2003-08-19 |
| 6570169 | Apparatus for manufacturing a semiconductor device and a method for manufacturing a semiconductor device | Kyoichi Suguro | 2003-05-27 |
| 6566632 | Hot plate and semiconductor device manufacturing method using the same | Tomio Katata, Nobuo Hayasaka | 2003-05-20 |
| 6547638 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Riichirou Aoki, Hiromi Yajima, Seiji Ishikawa, Manabu Tsujimura | 2003-04-15 |
| 6544804 | Semiconductor wafer having identification indication and method of manufacturing the same | Hiroyuki Yano | 2003-04-08 |
| 6538323 | Semiconductor device having an electrode structure comprising a conductive fine particle film | Atsuko Sakata, Keiichi Sasaki, Nobuo Hayasaka, Hirotaka Nishino | 2003-03-25 |
| 6528128 | Method of treating a substrate | Shinichi Ito | 2003-03-04 |