TK

Tomio Katata

KT Kabushiki Kaisha Toshiba: 26 patents #1,029 of 21,451Top 5%
IBM: 3 patents #26,272 of 70,183Top 40%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
SM Siemens Microelectronics: 1 patents #5 of 40Top 15%
Overall (All Time): #147,485 of 4,157,543Top 4%
27
Patents All Time

Issued Patents All Time

Showing 1–25 of 27 patents

Patent #TitleCo-InventorsDate
8148274 Semiconductor device having oxidized metal film and manufacture method of the same Junichi Wada, Atsuko Sakata, Seiichi Omoto, Masaaki Hatano, Soichi Yamashita +5 more 2012-04-03
7994054 Semiconductor device having oxidized metal film and manufacture method of the same Atsuko Sakata, Junichi Wada, Seiichi Omoto, Masaaki Hatano, Soichi Yamashita +5 more 2011-08-09
7791202 Semiconductor device having oxidized metal film and manufacture method of the same Atsuko Sakata, Junichi Wada, Seiichi Omoto, Masaaki Hatano, Soichi Yamashita +5 more 2010-09-07
7399706 Manufacturing method of semiconductor device Seiichi Omoto, Kazuyuki Higashi, Hitomi Yamaguchi, Hirokazu Ezawa, Atsuko Sakata 2008-07-15
7351656 Semiconductor device having oxidized metal film and manufacture method of the same Atsuko Sakata, Junichi Wada, Seiichi Omoto, Masaaki Hatano, Soichi Yamashita +5 more 2008-04-01
6946387 Semiconductor device and method for manufacturing the same Junichi Wada, Atsuko Sakata, Takamasa Usui, Masahiko Hasunuma, Hideki Shibata +3 more 2005-09-20
6768202 Semiconductor device and method of manufacturing the same Yasushi Oikawa, Junichi Wada 2004-07-27
6720253 Method of manufacturing semiconductor device having an aluminum wiring layer Junichi Wada, Yasushi Oikawa 2004-04-13
6699726 Semiconductor device and method for the manufacture thereof Osamu Hidaka, Sumito Ootsuki, Hiroshi Mochizuki, Hiroyuki Kanaya, Kumi Okuwada +2 more 2004-03-02
6673704 Semiconductor device and method of manufacturing the same Junichi Wada, Atsuko Sakata, Takamasa Usui, Masahiko Hasunuma, Hideki Shibata +3 more 2004-01-06
6605521 Method of forming an oxide film on a gate side wall of a gate structure Atul Ajmera, Karanam Balasubramanyam, Shang-Bin Ko 2003-08-12
6566632 Hot plate and semiconductor device manufacturing method using the same Nobuo Hayasaka, Katsuya Okumura 2003-05-20
6521927 Semiconductor device and method for the manufacture thereof Osamu Hidaka, Sumito Ootsuki, Hiroshi Mochizuki, Hiroyuki Kanaya, Kumi Okuwada +2 more 2003-02-18
6521010 Filter, filtering frame, and semiconductor device manufacturing method and apparatus 2003-02-18
6500686 Hot plate and method of manufacturing semiconductor device Junichi Wada 2002-12-31
6462395 Semiconductor device and method of producing the same Masatoshi Fukuda, Toshiya Suzuki, Naofumi Nakamura 2002-10-08
6440843 Semiconductor device and method for manufacturing the same Junichi Wada, Atsuko Sakata, Takamasa Usui, Masahiko Hasunuma, Hideki Shibata +3 more 2002-08-27
6436813 Semiconductor device and method of manufacturing the same Yasushi Oikawa, Junichi Wada 2002-08-20
6423192 Sputtering apparatus and film forming method Junichi Wada, Hideto Matsuyama, Atsuko Sakata, Koichi Watanabe 2002-07-23
6342131 Method of depositing a multilayer thin film by means of magnetron sputtering which controls the magnetic field Viraj Y. Sardesai, Christopher Parks, John Benedict 2002-01-29
6313535 Wiring layer of a semiconductor integrated circuit Junichiro Iba, Masaki Narita 2001-11-06
6307267 Semiconductor device and manufacturing method thereof Junichi Wada, Yasushi Oikawa 2001-10-23
6140236 High throughput A1-Cu thin film sputtering process on small contact via for manufacturable beol wiring Darryl D. Restaino, Chi-Hua Yang, Hans W. Poetzlberger, Hideaki Aochi 2000-10-31
6071810 Method of filling contact holes and wiring grooves of a semiconductor device Junichi Wada, Atsuko Sakata, Takamasa Usui, Masahiko Hasunuma, Hideki Shibata +3 more 2000-06-06
6048791 Semiconductor device with electrode formed of conductive layer consisting of polysilicon layer and metal-silicide layer and its manufacturing method Katsuya Okumura 2000-04-11