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Method and apparatus for material deposition |
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2013-07-23 |
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Method for electroless depositing a material on a surface of a wafer |
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2011-01-25 |
| 7358186 |
Method and apparatus for material deposition in semiconductor fabrication |
Yezdi Dordi, John M. Boyd, William Thie, Bob Maraschin, Fred C. Redeker |
2008-04-15 |
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Processes for treating morphologically-modified silicon electrode surfaces using gas-phase interhalogens |
— |
2007-03-20 |
| 6939796 |
System, method and apparatus for improved global dual-damascene planarization |
Shrikant Lohokare, Andrew D. Bailey, III, David Hemker |
2005-09-06 |
| 6821899 |
System, method and apparatus for improved local dual-damascene planarization |
Shrikant Lohokare, Andrew D. Bailey, III, David Hemker |
2004-11-23 |
| 6306244 |
Apparatus for reducing polymer deposition on substrate support |
William S. Kennedy, Thomas E. Wicker, Robert A. Maraschin, Alan M. Schoepp |
2001-10-23 |
| 6255221 |
Methods for running a high density plasma etcher to achieve reduced transistor device damage |
Eric A. Hudson, Jaroslaw W. Winniczek, Helen L. Maynard |
2001-07-03 |
| 6165910 |
Self-aligned contacts for semiconductor device |
Janet M. Flanner, Linda Marquez, Ian J. Morey |
2000-12-26 |
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Method for igniting a plasma inside a plasma processing reactor |
Thomas E. Wicker, Jian J. Chen |
2000-02-22 |
| 5863376 |
Temperature controlling method and apparatus for a plasma processing chamber |
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1999-01-26 |
| 5783496 |
Methods and apparatus for etching self-aligned contacts |
Janet M. Flanner, Prashant Gadgil, Linda Marquez, Adrian Doe |
1998-07-21 |
| 5346579 |
Magnetic field enhanced plasma processing chamber |
John Trow |
1994-09-13 |
| 4554047 |
Downstream apparatus and technique |
Daniel Flamm, Edward H. Mayer, Bernard C. Seiler |
1985-11-19 |
| 4498953 |
Etching techniques |
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1985-02-12 |
