RF

Ronald G. Filippi

IBM: 90 patents #680 of 70,183Top 1%
Globalfoundries: 21 patents #139 of 4,424Top 4%
AM AMD: 1 patents #5,683 of 9,279Top 65%
Infineon Technologies Ag: 1 patents #4,439 of 7,486Top 60%
GU Globalfoundries U.S.: 1 patents #22 of 211Top 15%
📍 Wappingers Falls, NY: #10 of 884 inventorsTop 2%
🗺 New York: #426 of 115,490 inventorsTop 1%
Overall (All Time): #11,118 of 4,157,543Top 1%
114
Patents All Time

Issued Patents All Time

Showing 101–114 of 114 patents

Patent #TitleCo-InventorsDate
7119545 Capacitive monitors for detecting metal extrusion during electromigration Ishtiaq Ahsan, Roy Iggulden, Edward W. Kiewra, Ping-Chuan Wang 2006-10-10
7098054 Method and structure for determining thermal cycle reliability Jason P. Gill, Vincent J. McGahay, Paul S. McLaughlin, Conal E. Murray, Hazara S. Rathore +2 more 2006-08-29
6989282 Control of liner thickness for improving thermal cycle reliability Lynne M. Gignac, Vincent J. McGahay, Conal E. Murray, Hazara S. Rathore, Thomas M. Shaw +1 more 2006-01-24
6870263 Device interconnection Lawrence A. Clevenger, Mark Hoinkis, Jeffery L. Hurd, Roy Iggulden, Herbert Palm +5 more 2005-03-22
6836106 Apparatus and method for testing semiconductors Kevin Brelsford, Kenneth P. Rodbell, Ping-Chuan Wang 2004-12-28
6803662 Low dielectric constant material reinforcement for improved electromigration reliability Ping-Chuan Wang, Kevin Brelsford 2004-10-12
6603321 Method and apparatus for accelerated determination of electromigration characteristics of semiconductor wiring Alvin W. Strong, Timothy D. Sullivan, Deborah Tibel, Michael Ruprecht, Carole D. Graas 2003-08-05
6518670 Electrically porous on-chip decoupling/shielding layer Jack A. Mandelman, Jeffrey P. Gambino, Richard A. Wachnik 2003-02-11
6448173 Aluminum-based metallization exhibiting reduced electromigration and method therefor Lawrence A. Clevenger, Kenneth P. Rodbell, Roy Iggulden, Chao-Kun Hu, Lynne M. Gignac +3 more 2002-09-10
6417572 Process for producing metal interconnections and product produced thereby Dureseti Chidambarrao, Robert Rosenberg, Thomas M. Shaw, Timothy D. Sullivan, Richard A. Wachnik 2002-07-09
6383920 Process of enclosing via for improved reliability in dual damascene interconnects Ping-Chuan Wang, Robert D. Edwards, Edward W. Kiewra, Roy Iggulden 2002-05-07
6202191 Electromigration resistant power distribution network Phillip Lin, Thomas M. Shaw, Richard A. Wachnik 2001-03-13
6037795 Multiple device test layout James J. Poulin, Robert D. Raviart, Kenneth P. Rodbell, Richard G. Smith, Timothy D. Sullivan +1 more 2000-03-14
5943601 Process for fabricating a metallization structure Takamasa Usui, Patrick W. DeHaven, Kenneth P. Rodbell, Chi-Hua Yang, Tomio Katata +1 more 1999-08-24