BL

Baozhen Li

IBM: 141 patents #321 of 70,183Top 1%
Globalfoundries: 15 patents #235 of 4,424Top 6%
ET Elpis Technologies: 2 patents #16 of 121Top 15%
SP Siemens Westinghouse Power: 1 patents #173 of 394Top 45%
📍 South Burlington, VT: #9 of 1,136 inventorsTop 1%
🗺 Vermont: #27 of 4,968 inventorsTop 1%
Overall (All Time): #5,398 of 4,157,543Top 1%
160
Patents All Time

Issued Patents All Time

Showing 126–150 of 160 patents

Patent #TitleCo-InventorsDate
8749293 Stackable programmable passive device and a testing method Fen Chen, Douglas D. Coolbaugh 2014-06-10
8726201 Method and system to predict a number of electromigration critical elements Jeanne P. Bickford, Peter A. Habitz, Paul S. McLaughlin, Dileep N. Netrabile 2014-05-13
8659156 Interconnect structure with an electromigration and stress migration enhancement liner Chih-Chao Yang 2014-02-25
8656325 Integrated circuit design method and system John E. Barwin, Amol A. Joshi, Michael R. Ouellette 2014-02-18
8642460 Semiconductor switching device and method of making the same Chih-Chao Yang, Stephen A. Cohen 2014-02-04
8609504 3D via capacitor with a floating conductive plate for improved reliability Chih-Chao Yang, Fen Chen 2013-12-17
8421186 Electrically programmable metal fuse Chunyan E. Tian, Chih-Chao Yang 2013-04-16
8405135 3D via capacitor with a floating conductive plate for improved reliability Chih-Chao Yang, Fen Chen 2013-03-26
8294505 Stackable programmable passive device and a testing method Fen Chen, Douglas D. Coolbaugh 2012-10-23
8232809 Determining critical current density for interconnect Chad M. Burke, Cathryn J. Christiansen 2012-07-31
8114768 Electromigration resistant via-to-line interconnect Paul S. McLaughlin, Timothy D. Sullivan 2012-02-14
7981771 Structures and methods to enhance Cu interconnect electromigration (EM) performance 2011-07-19
7981732 Programming of laser fuse Dinesh A. Badami, Tom C. Lee, Gerald Matusiewicz, William T. Motsiff, Christopher D. Muzzy +2 more 2011-07-19
7955971 Hybrid metallic wire and methods of fabricating same Chih-Chao Yang, Kaushik Chanda, Daniel C. Edelstein 2011-06-07
7830019 Via bottom contact and method of manufacturing same Kaushik Chanda, Lawrence A. Clevenger, Andrew P. Cowley, Jason P. Gill, Chih-Chao Yang 2010-11-09
7745324 Interconnect with recessed dielectric adjacent a noble metal cap Chih-Chao Yang, Shyng-Tsong Chen 2010-06-29
7692439 Structure for modeling stress-induced degradation of conductive interconnects Kaushik Chanda, Birendra Agarwala, Lawrence A. Clevenger, Andrew P. Cowley, Ronald G. Filippi +7 more 2010-04-06
7649262 Suppression of localized metal precipitate formation and corresponding metallization depletion in semiconductor processing Jonathan D. Chapple-Sokol, Terence B. Hook, Thomas L. McDevitt, Christopher A. Ponsolle, Bette B. Reuter +2 more 2010-01-19
7639032 Structure for monitoring stress-induced degradation of conductive interconnects Kaushik Chanda, Birendra Agarwala, Lawrence A. Clevenger, Andrew P. Cowley, Ronald G. Filippi +7 more 2009-12-29
7585764 VIA bottom contact and method of manufacturing same Kaushik Chanda, Lawrence A. Clevenger, Andrew P. Cowley, Jason P. Gill, Chih-Chao Yang 2009-09-08
7572650 Suppression of localized metal precipitate formation and corresponding metallization depletion in semiconductor processing Jonathan D. Chapple-Sokol, Terence B. Hook, Thomas L. McDevitt, Christopher A. Ponsolle, Bette B. Reuter +2 more 2009-08-11
7500208 Non-destructive evaluation of microstructure and interface roughness of electrically conducting lines in semiconductor integrated circuits in deep sub-micron regime Fen Chen, Jeffrey P. Gambino, Jason P. Gill, Timothy D. Sullivan 2009-03-03
7397260 Structure and method for monitoring stress-induced degradation of conductive interconnects Kaushik Chanda, Birendra Agarwala, Lawrence A. Clevenger, Andrew P. Cowley, Ronald G. Filippi +7 more 2008-07-08
7384824 Structure and programming of laser fuse Dinesh A. Badami, Tom C. Lee, Gerald Matusiewicz, William T. Motsiff, Christopher D. Muzzy +2 more 2008-06-10
7231617 Determination of grain sizes of electrically conductive lines in semiconductor integrated circuits Fen Chen, Jeffrey P. Gambino, Jason P. Gill, Timothy D. Sullivan 2007-06-12