Issued Patents All Time
Showing 101–125 of 147 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8356260 | Method and apparatus for monitoring cross-sectional shape of a pattern formed on a semiconductor device | Wataru Nagatomo, Hidetoshi Morokuma | 2013-01-15 |
| 8355559 | Method and apparatus for reviewing defects | Minoru Harada, Ryo Nakagaki, Kenji Obara | 2013-01-15 |
| 8331651 | Method and apparatus for inspecting defect of pattern formed on semiconductor device | Tomofumi Nishiura, Chie Shishido, Takumichi Sutani | 2012-12-11 |
| 8283630 | Method and apparatus for measuring dimension of circuit pattern formed on substrate by using scanning electron microscope | Tomofumi Nishiura | 2012-10-09 |
| 8237119 | Scanning type charged particle beam microscope and an image processing method using the same | Kenji Nakahira | 2012-08-07 |
| 8158938 | Scanning electron microscope and a method for imaging a specimen using the same | Wataru Nagatomo, Ryoichi Matsuoka, Hidetoshi Morokuma | 2012-04-17 |
| 8110800 | Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system | Chie Shishido, Maki Tanaka | 2012-02-07 |
| 8106357 | Scanning electron microscope and method for processing an image obtained by the scanning electron microscope | Kenji Nakahira, Toshifumi Honda | 2012-01-31 |
| 8073242 | SEM system and a method for producing a recipe | Tomofumi Nishiura, Ryoichi Matsuoka, Hidetoshi Morokuma | 2011-12-06 |
| 8045789 | Method and apparatus for inspecting defect of pattern formed on semiconductor device | Tomofumi Nishiura, Chie Shishido, Takumichi Sutani | 2011-10-25 |
| 7935927 | Method and apparatus for observing a specimen | Maki Tanaka, Hidetoshi Morokuma | 2011-05-03 |
| 7930067 | Motion editing apparatus and motion editing method for robot, computer program and robot apparatus | Tomohisa Moridaira | 2011-04-19 |
| 7897325 | Lithographic rinse solution and method for forming patterned resist layer using the same | Yoshihiro Sawada, Jun Koshiyama, Kazumasa Wakiya, Hidekazu Tajima | 2011-03-01 |
| 7889908 | Method and apparatus for measuring shape of a specimen | Maki Tanaka, Hidetoshi Morokuma | 2011-02-15 |
| 7888638 | Method and apparatus for measuring dimension of circuit pattern formed on substrate by using scanning electron microscope | Tomofumi Nishiura | 2011-02-15 |
| 7873205 | Apparatus and method for classifying defects using multiple classification modules | Hirohito Okuda, Yuji Takagi, Toshifumi Honda, Takehiro Hirai | 2011-01-18 |
| 7816062 | Method and apparatus for semiconductor device production process monitoring and method and apparatus for estimating cross sectional shape of a pattern | Wataru Nagatomo, Hidetoshi Morokuma, Hideaki Sasazawa | 2010-10-19 |
| 7811748 | Resist pattern forming method and composite rinse agent | Jun Koshiyama, Kazumasa Wakiya, Fumitake Kaneko, Hidekazu Tajima, Yoshihiro Sawada | 2010-10-12 |
| 7795197 | Cleaning liquid for lithography and method for resist pattern formation | Yoshihiro Sawada, Kazumasa Wakiya, Jun Koshiyama, Hidekazu Tajima | 2010-09-14 |
| 7764826 | Method and apparatus of reviewing defects on a semiconductor device | Toshifumi Honda | 2010-07-27 |
| 7759074 | Immunological latex turbidimetry method and reagent therefor | Tokio Sawai, Takeshi Matsuya, Tsuneo Okuyama | 2010-07-20 |
| 7756320 | Defect classification using a logical equation for high stage classification | Toshifumi Honda, Hirohito Okuda | 2010-07-13 |
| 7741260 | Rinsing fluid for lithography | Jun Koshiyama, Kazumasa Wakiya, Fumitake Kaneko, Hidekazu Tajima, Yoshihiro Sawada | 2010-06-22 |
| 7677694 | Image-forming apparatus and image-forming method | Moriyoshi Inaba, Kazuo Onodera, Hiroshi Kasayama, Yuichi Takahashi | 2010-03-16 |
| 7615746 | Method and apparatus for evaluating pattern shape of a semiconductor device | Wataru Nagatomo, Ryoichi Matsuoka | 2009-11-10 |