Issued Patents All Time
Showing 51–75 of 84 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7719658 | Imaging system for a microlithographical projection light system | Andreas Dorsel, Toralf Gruner, Bernhard Kneer, Susanne Beder, Norbert Wabra | 2010-05-18 |
| 7712905 | Imaging system with mirror group | David Shafer, Aurelian Dodoc, Hans-Juergen Mann | 2010-05-11 |
| 7697198 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Wilhelm Ulrich, Karl-Heinz Schuster | 2010-04-13 |
| 7679821 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann | 2010-03-16 |
| 7672047 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann | 2010-03-02 |
| 7551361 | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type | Hans-Juergen Rostalski, Aurelian Dodoc, Johannes Wangler, Karl-Heinz Schuster, Joerg Schultz +3 more | 2009-06-23 |
| 7511890 | Refractive optical imaging system, in particular projection objective for microlithography | Wilhelm Ulrich, David Shafer, Dieter Bader | 2009-03-31 |
| 7492509 | Projection optical system | Hans-Juergen Rostalski, Aurelian Dodoc, Wilhelm Ulrich | 2009-02-17 |
| 7463422 | Projection exposure apparatus | Vladimir Kamenow, Daniel Kraehmer, Michael Totzeck, Toralf Gruner, Aurelian Dodoc +4 more | 2008-12-09 |
| 7446952 | Catadioptric projection objective | — | 2008-11-04 |
| 7426082 | Catadioptric projection objective with geometric beam splitting | David Shafer, Aurelian Dodoc, Helmut Beierl, Wilhelm Ulrich | 2008-09-16 |
| 7408716 | Refractive projection objective for immersion lithography | Hans-Juergen Rostalski, Aurelian Dodoc, Helmut Beierl | 2008-08-05 |
| 7385756 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann | 2008-06-10 |
| 7372634 | Reticle-masking objective with aspherical lenses | Johannes Wangler, Karl-Heinz Schuster, Alexander Sohmer, Jorg Schultz, Jurgen Grunwald | 2008-05-13 |
| 7310187 | Projection objective, especially for microlithography, and method for adjusting a projection objective | Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich | 2007-12-18 |
| 7289279 | Lithographic objective having a first lens group including only lenses having a positive refractive power | Karl-Heinz Schuster | 2007-10-30 |
| 7256932 | Optical system for ultraviolet light | Toralf Gruner, Wolfgang Singer | 2007-08-14 |
| 7209292 | Projection objective, especially for microlithography, and method for adjusting a projection objective | Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich | 2007-04-24 |
| 7203010 | Catadioptric projection objective | Aurelian Dodoc | 2007-04-10 |
| 7190530 | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 | Hans-Jurgen Mann, Russell Hudyma | 2007-03-13 |
| 7187503 | Refractive projection objective for immersion lithography | Hans-Juergen Rostalski, Aurelian Dodoc, Helmut Beierl | 2007-03-06 |
| 7136220 | Catadioptric reduction lens | Wilhelm Ulrich, David Shafer, Helmut Beierl, Aurelian Dodoc | 2006-11-14 |
| 7130129 | Reticle-masking objective with aspherical lenses | Jurgen Grunwald, Johannes Wangler, Karl-Heinz Schuster, Alexander Sohmer, Jorg Schultz | 2006-10-31 |
| 7085075 | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 | Hans-Juergen Mann, Russell Hudyma | 2006-08-01 |
| 7046459 | Catadioptric reductions lens | David Shafer | 2006-05-16 |