Issued Patents All Time
Showing 26–50 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9449846 | Vertical gate separation | Jie Liu, Vinod R. Purayath, Anchuan Wang, Nitin K. Ingle | 2016-09-20 |
| 9412608 | Dry-etch for selective tungsten removal | Ching-Mei Hsu, Nitin K. Ingle, Zihui Li, Anchuan Wang | 2016-08-09 |
| 9373522 | Titanium nitride removal | Mandar B. Pandit, Anchuan Wang, Nitin K. Ingle | 2016-06-21 |
| 9355856 | V trench dry etch | Anchuan Wang, Nitin K. Ingle | 2016-05-31 |
| 9355862 | Fluorine-based hardmask removal | Mandar B. Pandit, Zhenjiang Cui, Mikhail Korolik, Anchuan Wang, Nitin K. Ingle | 2016-05-31 |
| 9309598 | Oxide and metal removal | Jie Liu, Anchuan Wang, Nitin K. Ingle, Jeffrey W. Anthis, Benjamin Schmiege | 2016-04-12 |
| 9299583 | Aluminum oxide selective etch | Anchuan Wang, Nitin K. Ingle | 2016-03-29 |
| 9299582 | Selective etch for metal-containing materials | Nitin K. Ingle, Jessica S. Kachian, Lin Xu, Soonam Park, Jeffrey W. Anthis | 2016-03-29 |
| 9299575 | Gas-phase tungsten etch | Seung Ho Park, Jie Liu, Anchuan Wang, Sang Jin Kim | 2016-03-29 |
| 9287134 | Titanium oxide etch | Lin Xu, Anchuan Wang, Nitin K. Ingle | 2016-03-15 |
| 9190293 | Even tungsten etch for high aspect ratio trenches | Jie Liu, Anchuan Wang, Nitin K. Ingle | 2015-11-17 |
| 9040422 | Selective titanium nitride removal | Anchuan Wang, Nitin K. Ingle, Dmitry Lubomirsky | 2015-05-26 |
| 8980763 | Dry-etch for selective tungsten removal | Ching-Mei Hsu, Nitin K. Ingle, Zihui Li, Anchuan Wang | 2015-03-17 |
| 8951429 | Tungsten oxide processing | Jie Liu, Seung Ho Park, Mikhail Korolik, Anchuan Wang, Nitin K. Ingle | 2015-02-10 |
| 8016948 | Method of removing contaminants from a coating surface comprising an oxide or fluoride of a group IIIB metal | Li Xu, Jennifer Y. Sun | 2011-09-13 |
| 7964512 | Method for etching high dielectric constant materials | Wei Liu, Yan Du, Mei Shen | 2011-06-21 |
| 7846264 | Cleaning method used in removing contaminants from a solid yttrium oxide-containing substrate | Li Xu, Jennifer Y. Sun | 2010-12-07 |
| 7780862 | Device and method for etching flash memory gate stacks comprising high-k dielectric | Meihua Shen, Wei Liu, Yan Du, Shashank Deshmukh | 2010-08-24 |
| 7368394 | Etch methods to form anisotropic features for high aspect ratio applications | Meihua Shen, Uwe Leucke, Guangxiang Jin, Wei Liu, Scott Williams | 2008-05-06 |
| 7270761 | Fluorine free integrated process for etching aluminum including chamber dry clean | Hui Chen, Anbei Jiang, Hong Shih, Steve S. Y. Mak | 2007-09-18 |
| 6787054 | Two-stage etching process | Scott Williams, Shaoher X. Pan | 2004-09-07 |
| 6699399 | Self-cleaning etch process | Xue-Yu Qian, Zhi-Wen Sun, Weinan Jiang, Arthur Y. Chen, Gerald Yin +5 more | 2004-03-02 |
| 6649532 | Methods for etching an organic anti-reflective coating | Hui Chen, Hong Shih, Chun Yan, Wai-Fan Yau | 2003-11-18 |
| 6527968 | Two-stage self-cleaning silicon etch process | Scott Williams, Shaoher X. Pan | 2003-03-04 |
| 6136211 | Self-cleaning etch process | Xue-Yu Qian, Zhi-Wen Sun, Weinan Jiang, Arthur Y. Chen, Gerald Yin +5 more | 2000-10-24 |