Issued Patents All Time
Showing 201–225 of 241 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8937004 | Apparatus and method for controllably implanting workpieces | Anthony Renau, Timothy J. Miller, Joseph C. Olson, Vikram Singh, James P. Buonodono +4 more | 2015-01-20 |
| 8907307 | Apparatus and method for maskless patterned implantation | Christopher J. Leavitt, Timothy J. Miller | 2014-12-09 |
| 8907300 | System and method for plasma control using boundary electrode | Svetlana B. Radovanov, Tyler Rockwell, Chris Campbell | 2014-12-09 |
| 8906576 | Material engineering for high performance Li-ion battery electrodes | Blake Darby, Xianfeng Lu, Tristan Y. Ma | 2014-12-09 |
| 8858816 | Enhanced etch and deposition profile control using plasma sheath engineering | Timothy J. Miller, George D. Papasouliotis, Vikram Singh | 2014-10-14 |
| 8835287 | Method of implanting a workpiece to improve growth of a compound semiconductor | Morgan Evans | 2014-09-16 |
| 8815720 | Method of etching a workpiece | Morgan Evans, Chi-Chun Chen | 2014-08-26 |
| 8778465 | Ion-assisted direct growth of porous materials | Xiangfeng Lu, Deepak A. Ramappa | 2014-07-15 |
| 8778603 | Method and system for modifying substrate relief features using ion implantation | Patrick M. Martin, Timothy J. Miller, Vikram Singh | 2014-07-15 |
| 8742373 | Method of ionization | Svetlana B. Radovanov, Christopher R. Hatem | 2014-06-03 |
| 8728951 | Method and system for ion-assisted processing | Xianfeng Lu, Deepak A. Ramappa | 2014-05-20 |
| 8716682 | Apparatus and method for multiple slot ion implantation | Anthony Renau, Timothy J. Miller, Joseph C. Olson | 2014-05-06 |
| 8697549 | Deposition of porous films for thermoelectric applications | Xianfeng Lu, Christopher R. Hatem, John Hautala | 2014-04-15 |
| 8698107 | Technique and apparatus for monitoring ion mass, energy, and angle in processing systems | Christopher J. Leavitt, Bon-Woong Koo, Anthony Renau | 2014-04-15 |
| 8698109 | Method and system for controlling critical dimension and roughness in resist features | Christopher J. Leavitt, Joseph C. Olson, Patrick M. Martin | 2014-04-15 |
| 8679960 | Technique for processing a substrate having a non-planar surface | George D. Papasouliotis, Vikram Singh, Heyun Yin, Helen L. Maynard | 2014-03-25 |
| 8664098 | Plasma processing apparatus | Timothy J. Miller, Svetlana B. Radovanov, Anthony Renau, Vikram Singh | 2014-03-04 |
| 8659229 | Plasma attenuation for uniformity control | Peter F. Kurunczi, Frank Sinclair, Costel Biloiu, Ernest E. Allen | 2014-02-25 |
| 8623171 | Plasma processing apparatus | Timothy J. Miller, Christopher J. Leavitt, Bernard G. Lindsay | 2014-01-07 |
| 8603591 | Enhanced etch and deposition profile control using plasma sheath engineering | Timothy J. Miller, George D. Papasouliotis, Vikram Singh | 2013-12-10 |
| 8592230 | Method for patterning a substrate using ion assisted selective depostion | Deepak A. Ramappa | 2013-11-26 |
| 8460569 | Method and system for post-etch treatment of patterned substrate features | Christopher R. Hatem, Patrick M. Martin, Timothy J. Miller | 2013-06-11 |
| 8461030 | Apparatus and method for controllably implanting workpieces | Anthony Renau, Timothy J. Miller, Joseph C. Olson, Vikram Singh, James P. Buonodono +4 more | 2013-06-11 |
| 8435727 | Method and system for modifying photoresist using electromagnetic radiation and ion implantation | Patrick M. Martin | 2013-05-07 |
| 8372735 | USJ techniques with helium-treated substrates | Christopher R. Hatem, Alexander C. Kontos | 2013-02-12 |