Issued Patents All Time
Showing 151–175 of 178 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6486082 | CVD plasma assisted lower dielectric constant sicoh film | Seon-Mee Cho, Peter Wai-Man Lee, Chi-I Lang, Dian Sugiarto, Chen-An Chen +2 more | 2002-11-26 |
| 6472333 | Silicon carbide cap layers for low dielectric constant silicon oxide layers | Li-Qun Xia, Paul Fisher, Margaret Gotuaco, Frederic Gaillard | 2002-10-29 |
| 6465366 | Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layers | Srinivas D. Nemani, Li-Qun Xia | 2002-10-15 |
| 6465372 | Surface treatment of C-doped SiO2 film to enhance film stability during O2 ashing | Li-Qun Xia, Tian-Hoe Lim, Frederic Gaillard | 2002-10-15 |
| 6426015 | Method of reducing undesired etching of insulation due to elevated boron concentrations | Li-Qun Xia, Francimar Campana | 2002-07-30 |
| 6413583 | Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound | Farhad Moghadam, David Cheung, Li-Qun Xia, Wai-Fan Yau, Chi-I Lang +4 more | 2002-07-02 |
| 6374831 | Accelerated plasma clean | Shankar N. Chandran, Scott A. Hendrickson, Gwendolyn D. Jones, Shankar Venkataraman | 2002-04-23 |
| 6360685 | Sub-atmospheric chemical vapor deposition system with dopant bypass | Li-Qun Xia | 2002-03-26 |
| 6352591 | Methods and apparatus for shallow trench isolation | Li-Qun Xia, Srinivas D. Nemani | 2002-03-05 |
| 6348099 | Methods and apparatus for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions | Li-Qun Xia, Srinivas D. Nemani | 2002-02-19 |
| 6347636 | Methods and apparatus for gettering fluorine from chamber material surfaces | Li-Qun Xia, Visweswaren Sivaramakrishnan, Srinivas D. Nemani, Gary Fong | 2002-02-19 |
| 6277200 | Dielectric film deposition employing a bistertiarybutylaminesilane precursor | Li-Qun Xia | 2001-08-21 |
| 6261975 | Method for depositing and planarizing fluorinated BPSG films | Li-Qun Xia, Francimar Campana | 2001-07-17 |
| 6218268 | Two-step borophosphosilicate glass deposition process and related devices and apparatus | Li-Qun Xia, Maria Galiano, Francimar Campana, Shankar Chandran | 2001-04-17 |
| 6177344 | BPSG reflow method to reduce thermal budget for next generation device including heating in a steam ambient | Li-Qun Xia, Richard A. Conti, Maria Galiano | 2001-01-23 |
| 6170492 | Cleaning process end point determination using throttle valve position | Hiroyuki Ueda, Hirotaka Tanabe, Makoto Okubo, Shankar Chandran | 2001-01-09 |
| 6153261 | Dielectric film deposition employing a bistertiarybutylaminesilane precursor | Li-Qun Xia | 2000-11-28 |
| 6121164 | Method for forming low compressive stress fluorinated ozone/TEOS oxide film | Xin Zhang, Bang Nguyen, Stuardo Robles, Peter Wai-Man Lee | 2000-09-19 |
| 6117244 | Deposition resistant lining for CVD chamber | Won Bae Bang, Thanh Pham | 2000-09-12 |
| 6114216 | Methods for shallow trench isolation | Li-Qun Xia, Srinivas D. Nemani | 2000-09-05 |
| 6110556 | Lid assembly for a process chamber employing asymmetric flow geometries | Won Bae Bang, Thanh Pham | 2000-08-29 |
| 6099647 | Methods and apparatus for forming ultra-shallow doped regions using doped silicon oxide films | Li-Qun Xia, Paul Edward Gee, Bang Nguyen | 2000-08-08 |
| 5994209 | Methods and apparatus for forming ultra-shallow doped regions using doped silicon oxide films | Li-Qun Xia, Paul Edward Gee, Bang Nguyen | 1999-11-30 |
| 5963840 | Methods for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions | Li-Qun Xia, Srinivas D. Nemani | 1999-10-05 |
| 5935340 | Method and apparatus for gettering fluorine from chamber material surfaces | Li-Qun Xia, Visweswaren Sivaramakrishnan, Srinivas D. Nemani, Gary Fong | 1999-08-10 |