Issued Patents 2021
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11170982 | Methods and apparatus for producing low angle depositions | Anantha K. Subramani, Praburam Gopal Raja, Steven V. Sansoni, John C. Forster, Yang Guo +5 more | 2021-11-09 |
| 11114282 | Phased array modular high-frequency source | Thai Cheng Chua, Christian Amormino, Dmitry A. Dzilno | 2021-09-07 |
| 11081317 | Modular high-frequency source | Thai Cheng Chua, Christian Amormino, Hanh Nguyen, Kallol Bera | 2021-08-03 |
| 11069504 | Creating ion energy distribution functions (IEDF) | Leonid Dorf, Travis Koh, Olivier Luere, Olivier Joubert, Rajinder Dhindsa +1 more | 2021-07-20 |
| 11049694 | Modular microwave source with embedded ground surface | Joseph AuBuchon, James D. Carducci, Larry D. Elizaga, Richard Fovell, Thai Cheng Chua | 2021-06-29 |
| 11037764 | Modular microwave source with local Lorentz force | Thai Cheng Chua, Mani Subramani | 2021-06-15 |
| 10985009 | Methods to deposit flowable (gap-fill) carbon containing films using various plasma sources | Lakmal C. Kalutarage, Mark Saly, David Thompson, William J. Durand, Kelvin Chan +1 more | 2021-04-20 |
| 10957565 | Processing tool having a monitoring device | Shimin Mao, Simon Huang, Ashish Goel, Anantha K. Subramani | 2021-03-23 |
| 10943768 | Modular high-frequency source with integrated gas distribution | Hanh Nguyen, Thai Cheng Chua | 2021-03-09 |
| 10937678 | Substrate support with multiple embedded electrodes | Thai Cheng Chua, Jaeyong Cho | 2021-03-02 |
| 10923320 | System for tunable workpiece biasing in a plasma reactor | Travis Koh, Leonid Dorf, Prabu Gopalraja | 2021-02-16 |
| 10903056 | Plasma source for rotating susceptor | Kallol Bera, Anantha K. Subramani, John C. Forster, Farzad Houshmand, Hanhong Chen | 2021-01-26 |
| 10904996 | Substrate support with electrically floating power supply | Travis Koh, Haitao Wang, Vijay D. Parkhe, Daniel Distaso, Christopher A. Rowland +2 more | 2021-01-26 |