| 11101113 |
Ion-ion plasma atomic layer etch process |
Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Yang Yang |
2021-08-24 |
| 11069504 |
Creating ion energy distribution functions (IEDF) |
Travis Koh, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more |
2021-07-20 |
| 11043361 |
Symmetric VHF source for a plasma reactor |
Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more |
2021-06-22 |
| 10991556 |
Adjustable extended electrode for edge uniformity control |
Olivier Luere, Sunil Srinivasan, Rajinder Dhindsa, James Rogers, Denis M. Koosau |
2021-04-27 |
| 10923321 |
Apparatus and method of generating a pulsed waveform |
Evgeny Kamenetskiy, James Rogers, Olivier Luere, Rajinder Dhindsa, Viacheslav Plotnikov |
2021-02-16 |
| 10923320 |
System for tunable workpiece biasing in a plasma reactor |
Travis Koh, Philip Allan Kraus, Prabu Gopalraja |
2021-02-16 |
| 10916408 |
Apparatus and method of forming plasma using a pulsed waveform |
Evgeny Kamenetskiy, James Rogers, Olivier Luere, Rajinder Dhindsa, Viacheslav Plotnikov |
2021-02-09 |
