Issued Patents 2021
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11101113 | Ion-ion plasma atomic layer etch process | Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Yang Yang | 2021-08-24 |
| 11069504 | Creating ion energy distribution functions (IEDF) | Travis Koh, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more | 2021-07-20 |
| 11043361 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more | 2021-06-22 |
| 10991556 | Adjustable extended electrode for edge uniformity control | Olivier Luere, Sunil Srinivasan, Rajinder Dhindsa, James Rogers, Denis M. Koosau | 2021-04-27 |
| 10923321 | Apparatus and method of generating a pulsed waveform | Evgeny Kamenetskiy, James Rogers, Olivier Luere, Rajinder Dhindsa, Viacheslav Plotnikov | 2021-02-16 |
| 10923320 | System for tunable workpiece biasing in a plasma reactor | Travis Koh, Philip Allan Kraus, Prabu Gopalraja | 2021-02-16 |
| 10916408 | Apparatus and method of forming plasma using a pulsed waveform | Evgeny Kamenetskiy, James Rogers, Olivier Luere, Rajinder Dhindsa, Viacheslav Plotnikov | 2021-02-09 |