Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11101113 | Ion-ion plasma atomic layer etch process | Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Leonid Dorf | 2021-08-24 |
| 11043372 | High-density low temperature carbon films for hardmask and other patterning applications | Eswaranand Venkatasubramanian, Samuel E. Gottheim, Pramit Manna, Kartik Ramaswamy, Takehito Koshizawa +2 more | 2021-06-22 |
| 11043375 | Plasma deposition of carbon hardmask | Eswaranand Venkatasubramanian, Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Gonzalo Monroy +2 more | 2021-06-22 |
| 11043387 | Methods and apparatus for processing a substrate | Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Gonzalo Monroy, Yue Guo | 2021-06-22 |
| 10957518 | Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece | Kartik Ramaswamy, Lawrence Wong, Steven Lane, Srinivas D. Nemani, Praburam Gopalraja | 2021-03-23 |