| 11127619 |
Workpiece carrier for high power with enhanced edge sealing |
Chunlei Zhang, Haitao Wang, Vijay D. Parkhe, Jaeyong Cho |
2021-09-21 |
| 11114284 |
Plasma reactor with electrode array in ceiling |
Kenneth S. Collins, Michael R. Rice, James D. Carducci, Shahid Rauf, Kallol Bera |
2021-09-07 |
| 11101113 |
Ion-ion plasma atomic layer etch process |
Kenneth S. Collins, James D. Carducci, Shahid Rauf, Leonid Dorf, Yang Yang |
2021-08-24 |
| 11043372 |
High-density low temperature carbon films for hardmask and other patterning applications |
Eswaranand Venkatasubramanian, Samuel E. Gottheim, Yang Yang, Pramit Manna, Takehito Koshizawa +2 more |
2021-06-22 |
| 11043360 |
Gas distribution plate assembly for high power plasma etch processes |
James D. Carducci, Kenneth S. Collins, Michael R. Rice, Richard Fovell, Vijay D. Parkhe |
2021-06-22 |
| 11043361 |
Symmetric VHF source for a plasma reactor |
Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins, Shahid Rauf +3 more |
2021-06-22 |
| 11043375 |
Plasma deposition of carbon hardmask |
Yang Yang, Eswaranand Venkatasubramanian, Kenneth S. Collins, Steven Lane, Gonzalo Monroy +2 more |
2021-06-22 |
| 11043387 |
Methods and apparatus for processing a substrate |
Yang Yang, Kenneth S. Collins, Steven Lane, Gonzalo Monroy, Yue Guo |
2021-06-22 |
| 11003080 |
Process chamber for field guided exposure and method for implementing the process chamber |
Srinivas D. Nemani |
2021-05-11 |
| 10957518 |
Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece |
Lawrence Wong, Steven Lane, Yang Yang, Srinivas D. Nemani, Praburam Gopalraja |
2021-03-23 |
| 10930540 |
Electrostatic chuck assembly having a dielectric filler |
Anwar Husain, Haitao Wang, Evans Lee, Jaeyong Cho, Hamid Noorbakhsh +3 more |
2021-02-23 |
| 10923405 |
Wafer processing equipment having capacitive micro sensors |
Leonard Tedeschi, Daniel T. McCormick, Robert Meagley |
2021-02-16 |
