| 11189502 |
Showerhead with interlaced gas feed and removal and methods of use |
Kallol Bera, Shahid Rauf, James D. Carducci, Vladimir Knyazik |
2021-11-30 |
| 11183375 |
Deposition system with multi-cathode and method of manufacture thereof |
Deepak Jadhav, Ashish Goel, Hanbing Wu, Prashanth Kothnur, Chi Hong Ching |
2021-11-23 |
| 11170982 |
Methods and apparatus for producing low angle depositions |
Praburam Gopal Raja, Steven V. Sansoni, John C. Forster, Philip Allan Kraus, Yang Guo +5 more |
2021-11-09 |
| 11101117 |
Methods and apparatus for co-sputtering multiple targets |
Hanbing Wu, Wei Wang, Ashish Goel, Srinivas Guggilla, Lavinia Nistor |
2021-08-24 |
| 11081623 |
Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices |
Mingwei Zhu, Nag B. Patibandla, Rongjun Wang, Daniel Lee Diehl, Vivek Agrawal |
2021-08-03 |
| 11043364 |
Process kit for multi-cathode processing chamber |
Hanbing Wu, Ashish Goel, Deepak Jadhav, Rongjun Wang, Chi Hong Ching |
2021-06-22 |
| 11011676 |
PVD buffer layers for LED fabrication |
Mingwei Zhu, Rongjun Wang, Nag B. Patibandla, Xianmin Tang, Vivek Agrawal +5 more |
2021-05-18 |
| 11011357 |
Methods and apparatus for multi-cathode substrate processing |
Hanbing Wu, Ashish Goel, Xiaodong Wang, Wei Wang, Rongjun Wang +1 more |
2021-05-18 |
| 10957565 |
Processing tool having a monitoring device |
Shimin Mao, Simon Huang, Ashish Goel, Philip Allan Kraus |
2021-03-23 |
| 10927449 |
Extension of PVD chamber with multiple reaction gases, high bias power, and high power impulse source for deposition, implantation, and treatment |
Jingjing Liu, Ludovic Godet, Srinivas D. Nemani, Yongmei Chen |
2021-02-23 |
| 10903056 |
Plasma source for rotating susceptor |
Kallol Bera, John C. Forster, Philip Allan Kraus, Farzad Houshmand, Hanhong Chen |
2021-01-26 |
| 10903067 |
Cooled reflective adapter plate for a deposition chamber |
Ashish Goel, Maurice E. Ewert |
2021-01-26 |
