Issued Patents All Time
Showing 26–49 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8450193 | Techniques for temperature-controlled ion implantation | Jonathan Gerald England, Richard S. Muka, Edwin Arevalo, Ziwei Fang | 2013-05-28 |
| 8312738 | Integrated controlled freeze zone (CFZ) tower and dividing wall (DWC) for enhanced hydrocarbon recovery | Edward J. Grave, Paul Scott Northrop, Narasimhan Sundaram | 2012-11-20 |
| 8202792 | Method of processing a substrate having a non-planar surface | George D. Papasouliotis, Heyun Yin | 2012-06-19 |
| 8188445 | Ion source | Ludovic Godet, Timothy J. Miller, Joseph C. Olson | 2012-05-29 |
| 8124487 | Method for enhancing tensile stress and source/drain activation using Si:C | Helen L. Maynard, Hans-Joachim L. Gossman | 2012-02-28 |
| 8101510 | Plasma processing apparatus | Ludovic Godet, Timothy J. Miller, Svetlana B. Radovanov, Anthony Renau | 2012-01-24 |
| 7863194 | Implantation of multiple species to address copper reliability | Heyun Yin, George D. Papasouliotis | 2011-01-04 |
| 7820533 | Multi-step plasma doping with improved dose control | Timothy J. Miller | 2010-10-26 |
| 7737013 | Implantation of multiple species to address copper reliability | Heyun Yin, George D. Papasouliotis | 2010-06-15 |
| 7687787 | Profile adjustment in plasma ion implanter | Ludovic Godet, George D. Papasouliotis, Ziwei Fang, Richard Appel, Vincent Deno +1 more | 2010-03-30 |
| 7528389 | Profile adjustment in plasma ion implanter | Ziwei Fang, Richard Appel, Vincent Deno, Harold Persing | 2009-05-05 |
| 7524743 | Conformal doping apparatus and method | Atul Gupta, Timothy J. Miller, Edmund J. Winder | 2009-04-28 |
| 7476849 | Technique for monitoring and controlling a plasma process | Bon-Woong Koo, Ludovic Godet, Vassilis Panayotis Vourloumis, Ziwei Fang | 2009-01-13 |
| 7453059 | Technique for monitoring and controlling a plasma process | Bon-Woong Koo, Ziwei Fang, Ludovic Godet, Vassilis Panayotis Vourloumis, Bernard G. Lindsay | 2008-11-18 |
| 7397048 | Technique for boron implantation | Edmund J. Winder, Harold Persing, Timothy J. Miller, Ziwei Fang, Atul Gupta | 2008-07-08 |
| 7122485 | Deposition profile modification through process chemistry | George D. Papasouliotis, Edith Goldner, Vishal Gauri, Md Sazzadur Rahman | 2006-10-17 |
| 7067440 | Gap fill for high aspect ratio structures | Atiye Bayman, Md Sazzadur Rahman, Weijie Zhang, Bart J. van Schravendijk, Vishal Gauri +1 more | 2006-06-27 |
| 7001854 | Hydrogen-based phosphosilicate glass process for gap fill of high aspect ratio structures | George D. Papasouliotis, Md Sazzadur Rahman, Pin Sheng Sun, Karen Prichard, Lauren Hall | 2006-02-21 |
| 6846745 | High-density plasma process for filling high aspect ratio structures | George D. Papasouliotis, Vishal Gauri, Raihan M. Tarafdar | 2005-01-25 |
| 6787483 | Gap fill for high aspect ratio structures | Atiye Bayman, Md Sazzadur Rahman, Weijie Zhang, Bart Van Schravendijk, Vishal Gauri +1 more | 2004-09-07 |
| 6596654 | Gap fill for high aspect ratio structures | Atiye Bayman, Md Sazzadur Rahman, Weijie Zhang, Bart J. van Schravendijk, Vishal Gauri +1 more | 2003-07-22 |
| 6468384 | Predictive wafer temperature control system and method | Robert J. Whiting, Paul Shufflebotham, Ajay Saproo | 2002-10-22 |
| 6042687 | Method and apparatus for improving etch and deposition uniformity in plasma semiconductor processing | Brian McMillin, Tom Ni, Michael Barnes, Richard Yang | 2000-03-28 |
| 5968275 | Methods and apparatus for passivating a substrate in a plasma reactor | Changhun Lee, Yun-Yen Jack Yang | 1999-10-19 |