Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10043655 | Plasma activated conformal dielectric film deposition | Shankar Swaminathan, Jon Henri, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram +3 more | 2018-08-07 |
| 9670579 | Method for depositing a chlorine-free conformal SiN film | Dennis M. Hausmann, Jon Henri, Easwar Srinivasan | 2017-06-06 |
| 9570274 | Plasma activated conformal dielectric film deposition | Shankar Swaminathan, Jon Henri, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram +3 more | 2017-02-14 |
| 9447499 | Dual plenum, axi-symmetric showerhead with edge-to-center gas delivery | Shambhu N. Roy, Vincent E. Burkhart, Natan Solomon, Sanjay Gopinath, Kaihan Ashtiani +3 more | 2016-09-20 |
| 9299559 | Flowable oxide film with tunable wet etch rate | Nerissa Draeger, Karena Shannon, Kaihan Ashtiani | 2016-03-29 |
| 9257302 | CVD flowable gap fill | Feng Wang, Victor Lu, Brian Lu, Wai-Fan Yau, Nerissa Draeger +4 more | 2016-02-09 |
| 9070555 | Method for depositing a chlorine-free conformal sin film | Dennis M. Hausmann, Jon Henri, Easwar Srinivasan | 2015-06-30 |
| 8999859 | Plasma activated conformal dielectric film deposition | Shankar Swaminathan, Jon Henri, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram +3 more | 2015-04-07 |
| 8846536 | Flowable oxide film with tunable wet etch rate | Nerissa Draeger, Karena Shannon, Kaihan Ashtiani | 2014-09-30 |
| 8728958 | Gap fill integration | Kaihan Ashtiani, Michael Wood, John Drewery, Naohiro Shoda, Lakshminarayana Nittala +1 more | 2014-05-20 |
| 8685867 | Premetal dielectric integration process | Michal Danek, Nerissa Draeger, Lakshminarayana Nittala | 2014-04-01 |
| 8592328 | Method for depositing a chlorine-free conformal sin film | Dennis M. Hausmann, Jon Henri, Easwar Srinivasan | 2013-11-26 |