Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6221792 | Metal and metal silicide nitridization in a high density, low pressure plasma reactor | Ching-Hwa Chen, Yea-Jer Arthur Chen | 2001-04-24 |
| 6209551 | Methods and compositions for post-etch layer stack treatment in semiconductor fabrication | Chan Syun David Yang | 2001-04-03 |
| 6080680 | Method and composition for dry etching in semiconductor fabrication | Changhun Lee | 2000-06-27 |
| 5968275 | Methods and apparatus for passivating a substrate in a plasma reactor | Changhun Lee, Vikram Singh | 1999-10-19 |
| 5904571 | Methods and apparatus for reducing charging during plasma processing | Roger Patrick, Phillip Jones, Kambiz Fallahpour, Wen-Ben Chou | 1999-05-18 |