Issued Patents All Time
Showing 101–125 of 261 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8722307 | Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer | Seiichiro Tachibana, Kazumi Noda, Masaki Ohashi, Wu-Song Huang, Dario L. Goldfarb +2 more | 2014-05-13 |
| 8697903 | Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid | Yuuki Suka, Yuji Harada, Koji Hasegawa, Takeshi Sasami | 2014-04-15 |
| 8691490 | Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process | Masaki Ohashi, Satoshi Watanabe, Youichi Ohsawa, Keiichi Masunaga | 2014-04-08 |
| 8663898 | Resist underlayer film composition and patterning process using the same | Tsutomu Ogihara, Takeru Watanabe, Yusuke Biyajima, Daisuke KORI, Toshihiko Fujii | 2014-03-04 |
| 8609889 | Photoacid generator, resist composition, and patterning process | Masaki Ohashi, Youichi Ohsawa, Takeru Watanabe | 2013-12-17 |
| 8603732 | Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process | Tsutomu Ogihara, Takeru Watanabe, Katsuya Takemura, Toshihiko Fujii, Daisuke KORI | 2013-12-10 |
| 8597869 | Sulfonium salt, resist composition, and patterning process | Masayoshi Sagehashi, Youichi Ohsawa, Koji Hasegawa, Tomohiro Kobayashi | 2013-12-03 |
| 8592956 | Resist underlayer film composition and patterning process using the same | Tsutomu Ogihara, Daisuke KORI, Yusuke Biyajima, Takeru Watanabe, Toshihiko Fujii | 2013-11-26 |
| 8592133 | Resist composition and patterning process | Satoshi Watanabe, Akinobu Tanaka, Takeru Watanabe | 2013-11-26 |
| 8586282 | Resist composition and patterning process | Satoshi Watanabe, Akinobu Tanaka, Takeru Watanabe | 2013-11-19 |
| 8541158 | Positive resist compositions and patterning process | Wataru Kusaki, Takeru Watanabe | 2013-09-24 |
| 8431323 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Takeru Watanabe, Satoshi Shinachi, Koji Hasegawa, Yuji Harada, Jun Hatakeyama +2 more | 2013-04-30 |
| 8426105 | Resist-modifying composition and pattern forming process | Takeru Watanabe, Masashi Iio, Kazuhiro Katayama, Jun Hatakeyama, Tsunehiro Nishi | 2013-04-23 |
| 8420290 | Acetal compounds and their preparation, polymers, resist compositions and patterning process | Koji Hasegawa, Masaki Ohashi, Tsunehiro Nishi, Masayoshi Sagehashi | 2013-04-16 |
| 8394570 | Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process | Masaki Ohashi, Satoshi Watanabe, Youichi Ohsawa | 2013-03-12 |
| 8349533 | Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process | Youichi Ohsawa, Jun Hatakeyama, Takeru Watanabe | 2013-01-08 |
| 8329384 | Resist-modifying composition and pattern forming process | Takeru Watanabe, Kazuhiro Katayama, Masashi Iio, Jun Hatakeyama, Tsunehiro Nishi | 2012-12-11 |
| 8323536 | Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film | Masaki Ohashi, Kazumi Noda, Seiichiro Tachibana | 2012-12-04 |
| 8313890 | Antireflective coating composition, antireflective coating, and patterning process | Seiichiro Tachibana, Kazumi Noda, Takeru Watanabe, Jun Hatakeyama | 2012-11-20 |
| 8288072 | Resist lower layer film-formed substrate | Jun Hatakeyama, Kazumi Noda, Seiichiro Tachibana, Tsutomu Ogihara | 2012-10-16 |
| 8283104 | Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same | Masaki Ohashi, Youichi Ohsawa | 2012-10-09 |
| 8247166 | Double patterning process | Katsuya Takemura, Tsunehiro Nishi, Jun Hatakeyama, Masaki Ohashi | 2012-08-21 |
| 8216766 | Polymer, polymer preparation method, resist composition and patterning process | Takeru Watanabe, Tomohiro Kobayashi, Tadahiro Sunaga, Yuichi Okawa, Hirofumi Io | 2012-07-10 |
| 8202677 | Chemically-amplified positive resist composition and patterning process thereof | Takanobu Takeda, Satoshi Watanabe, Youichi Ohsawa, Masaki Ohashi | 2012-06-19 |
| 8168367 | Resist composition and patterning process | Satoshi Watanabe, Akinobu Tanaka, Takeru Watanabe | 2012-05-01 |