Issued Patents All Time
Showing 151–175 of 261 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7807331 | Hydrogenated ring-opening metathesis polymer, resist composition and patterning process | Tomohiro Kobayashi, Takeru Watanabe, Tadahiro Sunaga, Yuichi Okawa | 2010-10-05 |
| 7794915 | Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method | Tadahiro Sunaga, Yuichi Okawa, Tomohiro Kobayashi | 2010-09-14 |
| RE41580 | Lactone-containing compounds, polymers, resist compositions, and patterning method | Koji Hasegawa, Tsunehiro Nishi, Jun Hatakeyama, Osamu Watanabe | 2010-08-24 |
| 7741015 | Patterning process and resist composition | Jun Hatakeyama, Takao Yoshihara, Koji Hasegawa, Yoshio Kawai, Katsuya Takemura | 2010-06-22 |
| 7687228 | Antireflection film composition and patterning process using the same | Jun Hatakeyama, Kazumi Noda, Seiichiro Tachibana, Tsutomu Ogihara | 2010-03-30 |
| 7687222 | Polymerizable ester compounds, polymers, resist compositions and patterning process | Takeru Watanabe, Koji Hasegawa, Seiichiro Tachibana, Masaki Ohashi | 2010-03-30 |
| 7678530 | Lactone-containing compound, polymer, resist composition, and patterning process | Koji Hasegawa, Satoshi Watanabe, Jun Hatakeyama, Seiichiro Tachibana | 2010-03-16 |
| 7670751 | Photoacid generator, resist composition, and patterning process | Masaki Ohashi, Youichi Ohsawa, Takeru Watanabe | 2010-03-02 |
| 7638256 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | Takeru Watanabe, Mutsuo Nakashima, Yoshitaka Hamada | 2009-12-29 |
| 7611821 | Positive resist compositions and patterning process | Tsunehiro Nishi | 2009-11-03 |
| 7592407 | Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Takeru Watanabe | 2009-09-22 |
| 7569324 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Takeru Watanabe | 2009-08-04 |
| 7556909 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Takeru Watanabe, Masaki Ohashi | 2009-07-07 |
| 7531290 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Takeru Watanabe | 2009-05-12 |
| 7531289 | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | Takeru Watanabe, Masaki Ohashi, Koji Hasegawa, Seiichiro Tachibana | 2009-05-12 |
| 7511169 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Youichi Ohsawa, Takeru Watanabe, Katsuhiro Kobayashi | 2009-03-31 |
| 7491483 | Polymers, positive resist compositions and patterning process | Jun Hatakeyama, Takanobu Takeda | 2009-02-17 |
| 7485408 | Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process | Mutsuo Nakashima, Koji Hasegawa, Takeru Watanabe | 2009-02-03 |
| 7378548 | Tertiary amine compounds having an ester structure and processes for preparing the same | Takeru Watanabe, Koji Hasegawa, Jun Hatakeyama | 2008-05-27 |
| 7312288 | Polymerizable fluorinated ester compounds and their preparing processes | Takeru Watanabe | 2007-12-25 |
| 7285368 | Polymerizable ester having sulfonamide structure, polymer, resist composition and patterning process | Takeru Watanabe | 2007-10-23 |
| 7282316 | Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same | Katsuhiro Kobayashi, Youichi Ohsawa, Eiji Fukuda, Shigeo Tanaka | 2007-10-16 |
| 7276324 | Nitrogen-containing organic compound, resist composition and patterning process | Takeru Watanabe, Koji Hasegawa, Katsuya Takemura, Kazumi Noda, Katsuhiro Kobayashi | 2007-10-02 |
| 7252925 | Nitrogen-containing organic compound, resist composition and patterning process | Takeru Watanabe, Katsuya Takemura, Akihiro Seki | 2007-08-07 |
| 7202318 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | Takeru Watanabe, Seiichiro Tachibana, Jun Hatakeyama | 2007-04-10 |