Issued Patents All Time
Showing 176–200 of 261 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7192684 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | Takeru Watanabe, Koji Hasegawa | 2007-03-20 |
| 7169541 | Compound, polymer, resist composition, and patterning process | Koji Hasegawa | 2007-01-30 |
| 7141351 | Basic compound, resist composition and patterning process | Takeru Watanabe, Koji Hasegawa | 2006-11-28 |
| 7141352 | Basic compound, resist composition and patterning process | Takeru Watanabe, Koji Hasegawa | 2006-11-28 |
| 7132215 | Ester compounds, polymers, resist compositions and patterning process | Koji Hasegawa, Takeru Watanabe | 2006-11-07 |
| 7084303 | Tertiary amine compounds having an ester structure and processes for preparing same | Takeru Watanabe, Koji Hasegawa, Jun Hatakeyama | 2006-08-01 |
| 7041846 | Alicyclic methacrylate having oxygen substituent group on α-methyl | Takeru Watanabe, Jun Hatakeyama | 2006-05-09 |
| 7037995 | Tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process | Takeru Watanabe, Koji Hasegawa | 2006-05-02 |
| 7029822 | Tertiary alcohol compounds having alicyclic structure | Koji Hasegawa, Takeru Watanabe | 2006-04-18 |
| 7012161 | Compound, fluorine-containing polymerizable cyclic olefin compound | Takeru Watanabe, Yuji Harada | 2006-03-14 |
| 6962767 | Acetal compound, polymer, resist composition and patterning process | Takeru Watanabe, Koji Hasegawa, Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2005-11-08 |
| 6946233 | Polymer, resist material and patterning method | Tsunehiro Nishi | 2005-09-20 |
| 6899990 | Epoxy compound having alicyclic structure, polymer, resist composition and patterning process | Koji Hasegawa, Takeru Watanabe, Tsunehiro Nishi | 2005-05-31 |
| 6844133 | Polymer, resist composition and patterning process | Tsunehiro Nishi, Koji Hasegawa | 2005-01-18 |
| 6830866 | Resist composition and patterning process | Tomohiro Kobayashi, Tsunehiro Nishi, Satoshi Watanabe, Shigehiro Nagura, Toshinobu Ishihara | 2004-12-14 |
| 6794111 | Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation | Tsunehiro Nishi, Seiichiro Tachibana, Takeru Watanabe, Koji Hasegawa, Tomohiro Kobayashi | 2004-09-21 |
| 6780563 | Polymer, resist composition and patterning process | Koji Hasegawa, Takeru Watanabe, Mutsuo Nakashima, Seiichiro Tachibana, Tsunehiro Nishi +1 more | 2004-08-24 |
| 6774258 | Tertiary alcohol compounds having alicyclic structure | Koji Hasegawa, Takeru Watanabe | 2004-08-10 |
| 6746818 | (Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning process | Koji Hasegawa, Takeru Watanabe | 2004-06-08 |
| 6743566 | Cyclic acetal compound, polymer, resist composition and patterning process | Mutsuo Nakashima, Seiichiro Tachibana, Takeru Watanabe, Koji Hasegawa, Tsunehiro Nishi +1 more | 2004-06-01 |
| 6703183 | Polymer, resist composition and patterning process | Tsunehiro Nishi, Koji Hasegawa, Satoshi Watanabe, Shigehiro Nagura | 2004-03-09 |
| 6673517 | Polymer, resist composition and patterning process | Tsunehiro Nishi | 2004-01-06 |
| 6673518 | Polymer, resist composition and patterning process | Tsunehiro Nishi, Koji Hasegawa | 2004-01-06 |
| 6673515 | Polymer, resist composition and patterning process | Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana, Koji Hasegawa, Takeru Watanabe +1 more | 2004-01-06 |
| 6670498 | Ester compounds, polymers, resist compositions and patterning process | Tsunehiro Nishi, Koji Hasegawa, Takeru Watanabe, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2003-12-30 |