Issued Patents All Time
Showing 76–100 of 261 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9372404 | Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer | Takeru Watanabe, Seiichiro Tachibana, Toshihiko Fujii, Kazumi Noda, Toshiharu Yano | 2016-06-21 |
| 9278899 | Method for producing 3,5-dimethyldodecanoic acid; and 4-carboxy-3,5-Dimethyl-3,5-dodecadienoic acid | Akihiro Baba, Naoki Ishibashi | 2016-03-08 |
| 9278900 | Method for producing 3,5-dimethyldodecanoic acid | Naoki Ishibashi, Akihiro Baba | 2016-03-08 |
| 9261783 | Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid | Yuuki Suka, Yuji Harada, Koji Hasegawa, Takeshi Sasami | 2016-02-16 |
| 9255056 | Omega-halo-2-alkynal | Miyoshi Yamashita, Takehiko Fukumoto | 2016-02-09 |
| 9126923 | Method for producing (E)-2-isopropyl-5-methyl-2,4-hexadienyl acetate | Naoki Ishibashi, Yoshiyuki Yumoto | 2015-09-08 |
| 9126920 | Method for producing 2-isopropylidene-5-methyl-4-hexenyl butyrate | Naoki Ishibashi, Miyoshi Yamashita, Yuki Miyake, Akihiro Baba, Yusuke Nagae | 2015-09-08 |
| 9076738 | Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivative | Takeru Watanabe, Toshihiko Fujii, Tsutomu Ogihara | 2015-07-07 |
| 9069245 | Near-infrared absorptive layer-forming composition and multilayer film | Masaki Ohashi, Seiichiro Tachibana, Kazumi Noda, Shozo Shirai, Wu-Song Huang +3 more | 2015-06-30 |
| 9057949 | Patterning process, resist composition, polymer, and polymerizable ester compound | Takeru Watanabe, Tomohiro Kobayashi, Jun Hatakeyama, Kazuhiro Katayama | 2015-06-16 |
| 9046764 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara, Kazumi Noda | 2015-06-02 |
| 9045587 | Naphthalene derivative, resist bottom layer material, and patterning process | Daisuke KORI, Katsuya Takemura, Takeru Watanabe, Tsutomu Ogihara | 2015-06-02 |
| 9034661 | Method for producing molecule immobilizing substrate, and molecule immobilizing substrate | Wataru Kusaki, Toshinobu Ishihara, Takeru Watanabe | 2015-05-19 |
| 8999625 | Silicon-containing antireflective coatings including non-polymeric silsesquioxanes | Martin Glodde, Wu-Song Huang, Javier Perez, Ratnam Sooriyakumaran, Tsutomu Ogihara +2 more | 2015-04-07 |
| 8933251 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Takeru Watanabe, Satoshi Shinachi, Koji Hasegawa, Yuji Harada, Jun Hatakeyama +2 more | 2015-01-13 |
| 8877422 | Resist underlayer film composition and patterning process using the same | Tsutomu Ogihara, Daisuke KORI, Yusuke Biyajima, Toshihiko Fujii, Takeru Watanabe | 2014-11-04 |
| 8853031 | Resist underlayer film composition and patterning process using the same | Tsutomu Ogihara, Daisuke KORI, Yusuke Biyajima, Takeru Watanabe, Toshihiko Fujii | 2014-10-07 |
| 8846846 | Naphthalene derivative, resist bottom layer material, and patterning process | Daisuke KORI, Katsuya Takemura, Takeru Watanabe, Tsutomu Ogihara | 2014-09-30 |
| 8835697 | Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process | Daisuke KORI, Katsuya Takemura, Tsutomu Ogihara, Takeru Watanabe, Hiroyuki Urano | 2014-09-16 |
| 8835094 | Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process | Koji Hasegawa, Takeru Watanabe, Tomohiro Kobayashi | 2014-09-16 |
| 8835092 | Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative | Takeru Watanabe, Tsutomu Ogihara, Katsuya Takemura, Toshihiko Fujii, Daisuke KORI | 2014-09-16 |
| 8795955 | Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process | Katsuya Takemura, Daisuke KORI, Takeru Watanabe, Tsutomu Ogihara | 2014-08-05 |
| 8791290 | Acetal compound, polymer, resist composition, and patterning process | Koji Hasegawa, Jun Hatakeyama, Takeshi Nagata, Seiichiro Tachibana | 2014-07-29 |
| 8791288 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | Tomohiro Kobayashi, Masayoshi Sagehashi, Takeru Watanabe, Koji Hasegawa, Seiichiro Tachibana | 2014-07-29 |
| 8722321 | Patterning process | Tomohiro Kobayashi, Akihiro Seki, Kentaro Kumaki | 2014-05-13 |