Issued Patents All Time
Showing 25 most recent of 54 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11823883 | Mass spectrometer detector and system and method using the same | Yungman Alan Liu, David A. Reed, Eli Cheifetz, Amit Weingarten, Alexander Kadyshevitch | 2023-11-21 |
| 11474016 | Hyper-spectral imaging of airborne biological particles | Joel C. Kent | 2022-10-18 |
| 11183377 | Mass spectrometer detector and system and method using the same | Yungman Alan Liu, David A. Reed, Eli Cheifetz, Amit Weingarten, Alexander Kadyshevitch | 2021-11-23 |
| 9607802 | Apparatus and methods for aberration correction in electron beam based system | — | 2017-03-28 |
| 8933425 | Apparatus and methods for aberration correction in electron beam based system | — | 2015-01-13 |
| 8831767 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2014-09-09 |
| 8692204 | Apparatus and methods for electron beam detection | Shinichi Kojima, Joseph Maurino, William M. Tong | 2014-04-08 |
| 8422010 | Methods and systems for determining a characteristic of a wafer | Michael D. Kirk, David L. Adler, Kris Bhaskar | 2013-04-16 |
| 8284394 | Methods and systems for determining a characteristic of a wafer | Michael D. Kirk, David L. Adler, Kris Bhaskar | 2012-10-09 |
| 8010222 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2011-08-30 |
| 7940386 | Scatterometry target employing non-periodic defect features to enhance or optimize target sensitivity to a parameter of interest | — | 2011-05-10 |
| 7933016 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Ady Levy, Boris Golovanevsky, Michael Friedmann, Ian Smith +10 more | 2011-04-26 |
| 7873504 | Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout | — | 2011-01-18 |
| 7847937 | Optical measurment systems and methods | — | 2010-12-07 |
| 7808638 | Scatterometry target and method | — | 2010-10-05 |
| 7760364 | Systems and methods for near-field heterodyne spectroscopy | Guorong V. Zhuang, John Fielden | 2010-07-20 |
| 7663746 | Method and apparatus for scanning, stitching and damping measurements of a double sided metrology inspection tool | Paul Sullivan, Geroge Kren, Rodney Smedt, Hans J. Hansen, David W. Shortt +1 more | 2010-02-16 |
| 7663753 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Ady Levy, Boris Golovanevsky, Michael Friedmann, Ian Smith +10 more | 2010-02-16 |
| 7659126 | Electrical test method and apparatus | Ian Smith | 2010-02-09 |
| 7557921 | Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools | Michael Adel, Moshe E. Preil, Kevin P. Monahan, Ben-ming Benjamin Tsai, Mark Ghinovker | 2009-07-07 |
| 7505619 | System and method for conducting adaptive fourier filtering to detect defects in dense logic areas of an inspection surface | Evan R. Mapoles, Grace Hsiu-Ling Chen, David W. Shortt | 2009-03-17 |
| 7436506 | Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool | Paul Sullivan, George Kren, Rodney Smedt, Hans J. Hansen, David W. Shortt +1 more | 2008-10-14 |
| 7430898 | Methods and systems for analyzing a specimen using atomic force microscopy profiling in combination with an optical technique | Michael Weber-Grabau, Michael Faeyrman, Ofir Zamir | 2008-10-07 |
| 7433040 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith +3 more | 2008-10-07 |
| 7423264 | Atomic force microscope | Marco Tortonese | 2008-09-09 |