| 12360063 |
System and method for measuring a sample by x-ray reflectance scatterometry |
Heath A. Pois, Bruno W. Schueler, Rodney Smedt, Jeffrey T. Fanton |
2025-07-15 |
|
| 12165863 |
Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry |
Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis |
2024-12-10 |
$59,049,000 |
| 11996259 |
Patterned x-ray emitting target |
Bruce H. Newcome, Bruno W. Schueler |
2024-05-28 |
$43,910,000 |
| 11874237 |
System and method for measuring a sample by x-ray reflectance scatterometry |
Heath A. Pois, Bruno Shueler, Rodney Smedt, Jeffrey T. Fanton |
2024-01-16 |
$25,463,000 |
| 11823883 |
Mass spectrometer detector and system and method using the same |
Christopher F. Bevis, Yungman Alan Liu, Eli Cheifetz, Amit Weingarten, Alexander Kadyshevitch |
2023-11-21 |
$22,838,000 |
| 11764050 |
Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry |
Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis |
2023-09-19 |
$20,904,000 |
| 11430647 |
Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry |
Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis |
2022-08-30 |
$25,703,000 |
| 11183377 |
Mass spectrometer detector and system and method using the same |
Christopher F. Bevis, Yungman Alan Liu, Eli Cheifetz, Amit Weingarten, Alexander Kadyshevitch |
2021-11-23 |
$27,609,000 |
| 10910208 |
Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry |
Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis |
2021-02-02 |
$15,872,000 |
| 10859519 |
Methods and systems for measuring periodic structures using multi-angle x-ray reflectance scatterometry (XRS) |
Heath A. Pois, Bruno W. Schueler, Rodney Smedt, Jeffrey T. Fanton |
2020-12-08 |
$13,735,000 |
| 10636644 |
Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry |
Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis |
2020-04-28 |
$6,890,000 |
| 10481112 |
Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) |
Heath A. Pois, Bruno W. Schueler, Rodney Smedt, Jeffrey T. Fanton |
2019-11-19 |
$4,701,000 |
| 10403489 |
Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry |
Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis |
2019-09-03 |
$5,351,000 |
| 10119925 |
Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) |
Heath A. Pois, Bruno W. Schueler, Rodney Smedt, Jeffrey T. Fanton |
2018-11-06 |
$4,674,000 |
| 10056242 |
Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry |
Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis |
2018-08-21 |
$3,446,000 |
| 9588066 |
Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) |
Heath A. Pois, Bruno W. Schueler, Rodney Smedt, Jeffrey T. Fanton |
2017-03-07 |
|
| 9297771 |
Methods and systems for fabricating platelets of a monochromator for X-ray photoelectron spectroscopy |
Jeffrey T. Fanton, Rodney Smedt, Bruno W. Schueler |
2016-03-29 |
|
| 9240254 |
System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy |
Bruno W. Schueler, Jeffrey T. Fanton, Rodney Smedt |
2016-01-19 |
|
| 9201030 |
Method and system for non-destructive distribution profiling of an element in a film |
Paola deCecco, Bruno W. Schueler, Michael Kwan, David S. Ballance |
2015-12-01 |
|
| 8916823 |
Method and system for non-destructive distribution profiling of an element in a film |
Paolo deCecco, Bruno W. Schueler, Michael Kwan, David S. Ballance |
2014-12-23 |
|
| 8610059 |
Method and system for non-destructive distribution profiling of an element in a film |
Paola deCecco, Bruno W. Schueler, Michael Kwan, David S. Ballance |
2013-12-17 |
|
| 8269167 |
Method and system for non-destructive distribution profiling of an element in a film |
Paola deCecco, Bruno W. Schueler, Michael Kwan, David S. Ballance |
2012-09-18 |
|
| 8011830 |
Method and system for calibrating an X-ray photoelectron spectroscopy measurement |
Bruno W. Schueler, Bruce H. Newcome, Jeffrey Allen Moore |
2011-09-06 |
|
| 7884321 |
Method and system for non-destructive distribution profiling of an element in a film |
Paola deCecco, Bruno W. Schueler, Michael Kwan, David S. Ballance |
2011-02-08 |
|
| 7411188 |
Method and system for non-destructive distribution profiling of an element in a film |
Paola deCecco, Bruno W. Schueler, Michael Kwan, Dave Ballance |
2008-08-12 |
|